公开(公告)号：US20180230597A1

公开(公告)日：2018-08-16

申请号：US15432619

申请日：2017-02-14

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Martin Jay SEAMONS ,  Ankit POKHREL ,  Greg CHICHKANOFF ,  Yizhen ZHANG ,  Jingmei LIANG ,  Jay D. PINSON, II ,  Dongqing LI ,  Juan Carlos ROCHA-ALVAREZ

IPC: C23C16/505 ,  C23C16/455 ,  C23C16/458

Abstract: Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chamber body defining a processing region and a plasma field. The chamber seasoning system is coupled to the processing chamber. The chamber seasoning system is configured to season the processing region and the plasma field. The remote plasma cleaning system is in communication with the processing chamber. The remote plasma cleaning system is configured to clean the processing region and the plasma field.