公开(公告)号：US20180230597A1

公开(公告)日：2018-08-16

申请号：US15432619

申请日：2017-02-14

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Martin Jay SEAMONS ,  Ankit POKHREL ,  Greg CHICHKANOFF ,  Yizhen ZHANG ,  Jingmei LIANG ,  Jay D. PINSON, II ,  Dongqing LI ,  Juan Carlos ROCHA-ALVAREZ

IPC: C23C16/505 ,  C23C16/455 ,  C23C16/458

Abstract: Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chamber body defining a processing region and a plasma field. The chamber seasoning system is coupled to the processing chamber. The chamber seasoning system is configured to season the processing region and the plasma field. The remote plasma cleaning system is in communication with the processing chamber. The remote plasma cleaning system is configured to clean the processing region and the plasma field.

公开(公告)号：US20180148840A1

公开(公告)日：2018-05-31

申请号：US15822276

申请日：2017-11-27

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Jay D. PINSON, II ,  DongQing LI ,  Jingmei LIANG ,  Yizhen ZHANG

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/4405 ,  C23C16/452 ,  C23C16/45578 ,  C23C16/4558 ,  C23C16/458 ,  C23C16/54 ,  H01J37/32357 ,  H01J37/32449 ,  H01J37/32862

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a processing chamber including a first RPS coupled to a lid of the processing chamber and a second RPS coupled to a side wall of the processing chamber. The first RPS is utilized for delivering deposition radicals into a processing region in the processing chamber and the second RPS is utilized for delivering cleaning radicals into the processing region. The processing chamber further includes a radical delivery ring disposed between a showerhead and a substrate support for delivering cleaning radicals from the second RPS into the processing region. Having separate RPSs for deposition and clean along with introducing radicals from the RPSs into the processing region using separate delivery channels minimizes cross contamination and cyclic change on the RPSs, leading to improved deposition rate drifting and particle performance.

公开(公告)号：US20180323093A1

公开(公告)日：2018-11-08

申请号：US15970496

申请日：2018-05-03

Applicant: Applied Materials, Inc.

Inventor： Yizhen ZHANG ,  Rupankar CHOUDHURY ,  Jay D. PINSON, II ,  Jason M. SCHALLER ,  Hanish Kumar PANAVALAPPIL KUMARANKUTTY

IPC: H01L21/67 ,  C23C16/46 ,  C23C16/458 ,  G02B6/42

Abstract: Embodiments described herein include integrated systems used to directly monitor a substrate temperature during a plasma enhanced deposition process and methods related thereto. In one embodiment, a substrate support assembly includes a support shaft, a substrate support disposed on the support shaft, and a substrate temperature monitoring system for measuring a temperature of a substrate to be disposed on the substrate support. The substrate temperature monitoring system includes a optical fiber tube, a light guide coupled to the optical fiber tube, and a cooling assembly disposed about a junction of the optical fiber tube and the light guide. Herein, at least a portion of the light guide is disposed in an opening extending through the support shaft and into the substrate support and the cooling assembly maintains the optical fiber tube at a temperature of less than about 100° C. during substrate processing.