公开(公告)号：US20180230597A1

公开(公告)日：2018-08-16

申请号：US15432619

申请日：2017-02-14

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Martin Jay SEAMONS ,  Ankit POKHREL ,  Greg CHICHKANOFF ,  Yizhen ZHANG ,  Jingmei LIANG ,  Jay D. PINSON, II ,  Dongqing LI ,  Juan Carlos ROCHA-ALVAREZ

IPC: C23C16/505 ,  C23C16/455 ,  C23C16/458

Abstract: Embodiments disclosed herein generally relate to a plasma processing system. The plasma processing system includes a processing chamber, a chamber seasoning system, and a remote plasma cleaning system. The processing chamber has a chamber body defining a processing region and a plasma field. The chamber seasoning system is coupled to the processing chamber. The chamber seasoning system is configured to season the processing region and the plasma field. The remote plasma cleaning system is in communication with the processing chamber. The remote plasma cleaning system is configured to clean the processing region and the plasma field.

公开(公告)号：US20180148840A1

公开(公告)日：2018-05-31

申请号：US15822276

申请日：2017-11-27

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Jay D. PINSON, II ,  DongQing LI ,  Jingmei LIANG ,  Yizhen ZHANG

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/4405 ,  C23C16/452 ,  C23C16/45578 ,  C23C16/4558 ,  C23C16/458 ,  C23C16/54 ,  H01J37/32357 ,  H01J37/32449 ,  H01J37/32862

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a processing chamber including a first RPS coupled to a lid of the processing chamber and a second RPS coupled to a side wall of the processing chamber. The first RPS is utilized for delivering deposition radicals into a processing region in the processing chamber and the second RPS is utilized for delivering cleaning radicals into the processing region. The processing chamber further includes a radical delivery ring disposed between a showerhead and a substrate support for delivering cleaning radicals from the second RPS into the processing region. Having separate RPSs for deposition and clean along with introducing radicals from the RPSs into the processing region using separate delivery channels minimizes cross contamination and cyclic change on the RPSs, leading to improved deposition rate drifting and particle performance.

公开(公告)号：US20170306493A1

公开(公告)日：2017-10-26

申请号：US15494186

申请日：2017-04-21

Applicant: Applied Materials, Inc.

Inventor： Daemian RAJ ,  Ying MA ,  DongQing LI ,  Jay D. PINSON, II

IPC: C23C16/50 ,  H01J37/32 ,  C23C16/455 ,  C23C16/44 ,  H01L21/02 ,  B08B7/00

CPC classification number: C23C16/50 ,  C23C16/4401 ,  C23C16/4405 ,  C23C16/4408 ,  C23C16/452 ,  C23C16/45561 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/54 ,  H01J37/32449 ,  H01J37/32899

Abstract: A method and apparatus for a deposition chamber is provided and includes a twin chamber that includes a first remote plasma system coupled and dedicated to a first processing region, a second remote plasma system coupled and dedicated to a second processing region, and a third remote plasma system shared by the first processing region and the second processing region.

公开(公告)号：US20200071823A1

公开(公告)日：2020-03-05

申请号：US16114558

申请日：2018-08-28

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Yixi TIAN ,  Shih Chang CHEN ,  Jin SUN ,  Rodolfo PEREZ ,  Stanley WU

IPC: C23C16/458 ,  G01B21/30

Abstract: The present disclosure relates to a flexible support to aid in a measurement of flatness of a susceptor. The flexible support has a first support block having a substantially flat upper surface and a lower surface having a first aperture formed therein. The flexible support further has a second support block having a substantially flat lower surface and an upper surface having a second aperture formed therein. The flexible support further has a support pin configured to be receivable in the first aperture and the second aperture, the support pin configured to retain the first support block and the second support block in a spaced apart relation while allowing restricted motion of the first support block relative to the second support block via deformation of the support pin. The flexible support further has a guide disposed between the first support block and the second support block, the guide configured to allow the first support block and the second support block to move axially relative to the guide.

公开(公告)号：US20200370174A1

公开(公告)日：2020-11-26

申请号：US16806656

申请日：2020-03-02

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Lin ZHANG ,  Jiyong HUANG ,  Joseph C. WERNER ,  Stanley WU ,  Mahesh Adinath KANAWADE ,  Yikai CHEN ,  Yixing LIN ,  Ying MA

IPC: C23C16/44 ,  C01F17/265

Abstract: Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.

公开(公告)号：US20190043744A1

公开(公告)日：2019-02-07

申请号：US16046105

申请日：2018-07-26

Applicant: Applied Materials, Inc.

Inventor： Tom K. CHO ,  Ali SALEHPOUR ,  Stanley WU ,  Ying MA

IPC: H01L21/677 ,  H01L21/67

Abstract: A method and apparatus for monitoring substrate lift pin operation is disclosed and includes a support pedestal for a vacuum chamber, the support pedestal comprising a body having a plurality of openings formed between two major sides of the body, and a substrate support device disposed in each of the plurality of openings, each of the support devices comprising a housing disposed in the body, the housing having a bore formed therethrough, and a support pin disposed in the bore, wherein the body includes a monitoring device positioned proximal to the support pins of each of the substrate support devices.

公开(公告)号：US20180258531A1

公开(公告)日：2018-09-13

申请号：US15893184

申请日：2018-02-09

Applicant: Applied Materials, Inc.

Inventor： Ying MA ,  Daemian RAJ ,  Greg CHICHKANOFF

IPC: C23C16/455 ,  H01J37/32 ,  C23C16/513

Abstract: Implementations described herein generally relate to an apparatus for forming flowable films. In one implementation, the apparatus is a diffuser including a body having a first surface and a second surface opposing the first surface, a plurality of dome structures formed in the first surface, a central manifold formed in the second surface, and a plurality of tubular conduits coupled between the central manifold and a respective one of the plurality of dome structures, at least a portion of the plurality of tubular conduits being positioned diagonally relative to a plane of the first surface.