公开(公告)号：US20250029816A1

公开(公告)日：2025-01-23

申请号：US18773859

申请日：2024-07-16

Applicant: Applied Materials, Inc.

Inventor： Douglas Long ,  Vinod Kumar Konda Purathe ,  Dien-Yeh Wu ,  Jallepally Ravi ,  Hideaki Goto ,  Manjunatha Koppa ,  Hiroyuki Takahama ,  Shih Yao Hsu ,  Sandesh Yadamane Dharmaiah

IPC: H01J37/32 ,  C23C16/455

Abstract: Gas distribution assemblies for a semiconductor manufacturing processing chamber comprising a first showerhead with a first flange and a second showerhead with a second flange. A first two-piece RF isolator comprises a first inner RF isolator spaced from a first outer RF isolator. The first inner RF isolator spaced from the first flange of the first showerhead to create a first flow path. A second two-piece RF isolator comprises a second inner RF isolator spaced from a second outer RF isolator. The second RF isolator spaced from the second flange of the second showerhead to create a second flow path. Processing chambers incorporating the gas distribution assemblies, and processing methods using the gas distribution assemblies are also described.