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公开(公告)号:US12019507B2
公开(公告)日:2024-06-25
申请号:US17748780
申请日:2022-05-19
Applicant: Applied Materials, Inc.
Inventor: Fei Li , Jimmy Iskandar , James Robert Moyne
CPC classification number: G06F11/0793 , G06F11/0721 , G06F11/3495
Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates having property values that meet threshold values. The method further includes generating, based on the trace data and a plurality of allowable types of variance, a guardband including an upper limit and a lower limit for fault detection. The method further includes causing, based on the guardband, performance of a corrective action associated with the substrate processing system.
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公开(公告)号:US20230376373A1
公开(公告)日:2023-11-23
申请号:US17748780
申请日:2022-05-19
Applicant: Applied Materials, Inc.
Inventor: Fei Li , Jimmy Iskandar , James Robert Moyne
CPC classification number: G06F11/0793 , G06F11/0721 , G06F11/3495
Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates having property values that meet threshold values. The method further includes generating, based on the trace data and a plurality of allowable types of variance, a guardband including an upper limit and a lower limit for fault detection. The method further includes causing, based on the guardband, performance of a corrective action associated with the substrate processing system.
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公开(公告)号:US20250094829A1
公开(公告)日:2025-03-20
申请号:US18368311
申请日:2023-09-14
Applicant: Applied Materials, Inc.
Inventor: Fei Li , Jimmy Iskandar , James Robert Moyne
IPC: G06N5/022
Abstract: An electronic device manufacturing system configured identify a machine-learning model trained to generate analytic or predictive data for a first substrate processing domain associated with a type of substrate processing system. The system is further configured to obtain first trace data pertaining to the first domain used to train the machine-learning model. The system is further configured to a transfer model for a second substrate processing domain associated with the type of substrate processing system. The transfer model is generated based on the first trace data pertaining to the first substrate processing domain and second trace data pertaining to the second substrate processing domain. Using the transfer model, at least one of the machine-learning model or current trace data associated with the second substrate processing domain is modified to enable the machine-learning model to generate analytic or predictive data associated with the second substrate processing domain.
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公开(公告)号:US20240419813A1
公开(公告)日:2024-12-19
申请号:US18209821
申请日:2023-06-14
Applicant: Applied Materials, Inc.
Inventor: Fei Li , Jimmy Iskandar , Michael D. Armacost
Abstract: An electronic device manufacturing system configured to receive, by a first computing system, a request for manufacturing process data request. The system further uses a first cryptographic key controlled by a first entity and a second cryptographic key controlled by a second entity, a database management system to retrieve the manufacturing process data from a data store. The system further obtains, using the database management system, the manufacturing process data stored in the data store. The manufacturing process data is encrypted. The system further sends the encrypted manufacturing process data to a second computing system configured to perform one or more anonymization operations on the manufacturing process data.
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公开(公告)号:US20230376374A1
公开(公告)日:2023-11-23
申请号:US17748783
申请日:2022-05-19
Applicant: Applied Materials, Inc.
Inventor: Jimmy Iskandar , Fei Li , James Robert Moyne
CPC classification number: G06F11/0793 , G06F11/0721 , G06F11/3495
Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates having property values that meet threshold values. The method further includes determining, based on a guardband, guardband violation data points of the plurality of data points of the trace data. The method further includes determining, based on the guardband violation data points, guardband violation shape characterization. Classification of additional guardband violation data points of additional trace data is to be based on the guardband violation shape characterization. Performance of a corrective action associated with the substrate processing system is based on the classification.
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公开(公告)号:US20230376020A1
公开(公告)日:2023-11-23
申请号:US17748774
申请日:2022-05-19
Applicant: Applied Materials, Inc.
Inventor: Jimmy Iskandar , Fei Li , James Robert Moyne
IPC: G05B19/418
CPC classification number: G05B19/41885 , G05B19/41875 , G05B19/4183 , G06N20/00
Abstract: A method includes identifying trace data including a plurality of data points, the trace data being associated with production, via a substrate processing system, of substrates that have property values that meet threshold values. The method further includes determining, based on the trace data, a dynamic acceptable area outside of guardband limits. The method further includes causing, based on the dynamic acceptable area outside of the guardband limits, performance of a corrective action associated with the substrate processing system.
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