公开(公告)号：US20220357656A1

公开(公告)日：2022-11-10

申请号：US17740116

申请日：2022-05-09

Applicant: Applied Materials, Inc.

Inventor： Hao TANG ,  Kang LUO ,  Erica CHEN ,  Yongan XU

IPC: G03F7/00 ,  G02B5/18

Abstract: A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.

公开(公告)号：US20230341769A1

公开(公告)日：2023-10-26

申请号：US18333290

申请日：2023-06-12

Applicant: Applied Materials, Inc.

Inventor： Hao TANG ,  Kang LUO ,  Erica CHEN ,  Yongan XU

IPC: G03F7/00 ,  G02B5/18

CPC classification number: G03F7/0005 ,  G02B5/1857 ,  G03F7/0002

Abstract: A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.

公开(公告)号：US20230305203A1

公开(公告)日：2023-09-28

申请号：US18183273

申请日：2023-03-14

Applicant: Applied Materials, Inc.

Inventor： Hao TANG ,  Kang LUO ,  Yongan XU ,  Andrew CEBALLOS ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: G02B5/18 ,  G02B6/02 ,  G02B6/42 ,  G02B6/34

CPC classification number: G02B5/1847 ,  G02B6/02038 ,  G02B6/4257 ,  G02B6/34 ,  G02B2207/101

Abstract: Embodiments of the present disclosure relate to optical device fabrication using methods of discrete grating assembly and optical interconnection. Discrete gratings corresponding to one of an input coupling grating, an intermediate grating, or an output coupling grating of an optical device are formed on separated donor substrates. The donor substrates are diced into individual gratings and adhered to an optical device substrate. An inkjet material is disposed between the gratings to optically interconnect the portions of the optical device.

公开(公告)号：US20220357668A1

公开(公告)日：2022-11-10

申请号：US17661927

申请日：2022-05-04

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Hao TANG ,  Nai-Wen PI ,  Yongan XU

IPC: G03F7/20

Abstract: An image projection system is provided. The system can be used for performing lithography. The system includes a deuterium light source, a converging lens coupled to the deuterium light source. The system includes an aperture configured to provide image tiling disposed adjacent to the converging lens. The system includes a movable stage disposed adjacent to the aperture. A method of fabricating an optical device is provided. The method includes depositing a resist over a substrate and determining an exposure pattern for the optical device. The method includes exposing a portion of the resist with a light beam based on the determined exposure pattern. Exposing the portion of the resist includes directing the light beam from a deuterium light source to the substrate and developing the resist.