公开(公告)号：US20230144586A1

公开(公告)日：2023-05-11

申请号：US17914840

申请日：2020-04-20

Applicant: Applied Materials, Inc.

Inventor： Qin ZHONG ,  Hwan Joo JEONG

IPC: G03F7/20 ,  G06T7/174 ,  G06T1/00

CPC classification number: G03F7/70516 ,  G06T7/174 ,  G06T1/0007 ,  G06T2207/10052 ,  G06T2207/20016

Abstract: Aspects of the present disclosure relate to methods and apparatus for correcting lithography systems. In one implementation, a method of operating a lithography system includes directing first light beams toward a reflective surface of a first substrate using an optical module. The method includes directing the first light beams collected through at least an objective lens toward a camera, and taking a plurality of first images of the first light beams. The method includes directing second light beams at an oblique angle toward a patterned surface of a second substrate using an illumination source disposed below the objective lens. The method includes directing the second light beams collected through at least an objective lens toward a camera, and taking a plurality of second images of the second light beams. The method includes determining a tip correction, a tilt correction, and an optimal vertical position for the optical module.