公开(公告)号：US20190064683A1

公开(公告)日：2019-02-28

申请号：US15686815

申请日：2017-08-25

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Qin ZHONG

IPC: G03F9/00 ,  G03F7/20

Abstract: Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.

公开(公告)号：US20210216019A1

公开(公告)日：2021-07-15

申请号：US17217799

申请日：2021-03-30

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Muhammet POYRAZ ,  Qin ZHONG ,  Pacha MONGKOLWONGROJN

IPC: G03F7/20

Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.

公开(公告)号：US20200264514A1

公开(公告)日：2020-08-20

申请号：US16277805

申请日：2019-02-15

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Muhammet POYRAZ ,  Qin ZHONG ,  Pacha MONGKOLWONGROJN

IPC: G03F7/20

Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.

公开(公告)号：US20230144586A1

公开(公告)日：2023-05-11

申请号：US17914840

申请日：2020-04-20

Applicant: Applied Materials, Inc.

Inventor： Qin ZHONG ,  Hwan Joo JEONG

IPC: G03F7/20 ,  G06T7/174 ,  G06T1/00

CPC classification number: G03F7/70516 ,  G06T7/174 ,  G06T1/0007 ,  G06T2207/10052 ,  G06T2207/20016

Abstract: Aspects of the present disclosure relate to methods and apparatus for correcting lithography systems. In one implementation, a method of operating a lithography system includes directing first light beams toward a reflective surface of a first substrate using an optical module. The method includes directing the first light beams collected through at least an objective lens toward a camera, and taking a plurality of first images of the first light beams. The method includes directing second light beams at an oblique angle toward a patterned surface of a second substrate using an illumination source disposed below the objective lens. The method includes directing the second light beams collected through at least an objective lens toward a camera, and taking a plurality of second images of the second light beams. The method includes determining a tip correction, a tilt correction, and an optimal vertical position for the optical module.

公开(公告)号：US20190128825A1

公开(公告)日：2019-05-02

申请号：US15962981

申请日：2018-04-25

Applicant: Applied Materials, Inc.

Inventor： Qin ZHONG ,  Antoine P. MANENS ,  Hwan J. JEONG

IPC: G01N21/958 ,  G02B26/08 ,  G01M11/02 ,  G03F7/20

CPC classification number: G01N21/958 ,  G01M11/0278 ,  G01N2021/9583 ,  G02B26/0833 ,  G03F7/70025 ,  G03F7/70291 ,  G03F7/70316 ,  G03F7/706 ,  G03F9/7026

Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.