公开(公告)号：US20230097346A1

公开(公告)日：2023-03-30

申请号：US17490012

申请日：2021-09-30

Applicant: Applied Materials, Inc.

Inventor： Jiheng Zhao ,  Guangwei Sun ,  Jrjyan Jerry Chen ,  Jeffrey Kho

IPC: C23C16/455 ,  H01L21/67

Abstract: A flow guide apparatus includes an upper flow guide structure configured to receive a first gas from a remote source, and a lower flow guide structure attached to the upper flow guide structure. The upper flow guide structure and the lower flow guide structure are configured to receive at least one gas from at least one remote source. The flow guide apparatus further includes a line diffuser structure disposed between the lower flow guide structure and the upper flow guide structure. The line diffuser structure has a long axis along a length of the upper flow guide structure and a short axis. The line diffuser structure includes a plurality of through holes that are configured to approximately evenly distribute the at least one gas as it is output into a reactor.