公开(公告)号：US20240344198A1

公开(公告)日：2024-10-17

申请号：US18630981

申请日：2024-04-09

Applicant: Applied Materials, Inc.

Inventor： Guangwei Sun ,  Jeffrey A. Kho ,  Lai Zhao

IPC: C23C16/455

CPC classification number: C23C16/45559 ,  C23C16/45544

Abstract: An assembly includes a backing plate and a diffuser plate configured to be disposed under the backing plate. The diffuser plate forms purge holes in a first region of the diffuser plate between a diffuser plate upper surface and a diffuser plate lower surface. The diffuser plate forms perforated area holes in a second region of the diffuser plate between the diffuser plate upper surface and the diffuser plate lower surface. Each of the perforated area holes has a first width at the diffuser plate upper surface and a second width at the diffuser plate lower surface. The second width is larger than the first width.

公开(公告)号：US20210102291A1

公开(公告)日：2021-04-08

申请号：US17061844

申请日：2020-10-02

Applicant: Applied Materials, Inc.

Inventor： Kevin Griffin ,  Guangwei Sun

IPC: C23C16/455 ,  C23C16/458

Abstract: Apparatus and methods for processing substrates using a gas injector unit with a quartz plate are provided. The gas injector unit comprises an injector body with a first opening extending through the injector body. The first opening has a nut portion and a clamp portion. A nut is positioned within the nut portion spaced from the injector body by a spring. A clamp is positioned within the clamp portion, which may be remotely located on a hub for connection with the injector body. A screw extends through the opening in the clamp, a portion of the injector body, the spring and into a connection portion of the nut. Gas distribution assemblies and processing chambers incorporating the gas injector unit are also described.

公开(公告)号：US10697062B2

公开(公告)日：2020-06-30

申请号：US16032854

申请日：2018-07-11

Applicant: Applied Materials, Inc.

Inventor： Chien-Teh Kao ,  Jeffrey A. Kho ,  Xiangxin Rui ,  Jianhua Zhou ,  Shinichi Kurita ,  Shouqian Shao ,  Guangwei Sun

IPC: C23C16/455 ,  C23C16/44

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.

公开(公告)号：US20230097346A1

公开(公告)日：2023-03-30

申请号：US17490012

申请日：2021-09-30

Applicant: Applied Materials, Inc.

Inventor： Jiheng Zhao ,  Guangwei Sun ,  Jrjyan Jerry Chen ,  Jeffrey Kho

IPC: C23C16/455 ,  H01L21/67

Abstract: A flow guide apparatus includes an upper flow guide structure configured to receive a first gas from a remote source, and a lower flow guide structure attached to the upper flow guide structure. The upper flow guide structure and the lower flow guide structure are configured to receive at least one gas from at least one remote source. The flow guide apparatus further includes a line diffuser structure disposed between the lower flow guide structure and the upper flow guide structure. The line diffuser structure has a long axis along a length of the upper flow guide structure and a short axis. The line diffuser structure includes a plurality of through holes that are configured to approximately evenly distribute the at least one gas as it is output into a reactor.

公开(公告)号：US11332828B2

公开(公告)日：2022-05-17

申请号：US17061844

申请日：2020-10-02

Applicant: Applied Materials, Inc.

Inventor： Kevin Griffin ,  Guangwei Sun

IPC: C23C16/40 ,  C23C16/455 ,  C23C16/458

Abstract: Apparatus and methods for processing substrates using a gas injector unit with a quartz plate are provided. The gas injector unit comprises an injector body with a first opening extending through the injector body. The first opening has a nut portion and a clamp portion. A nut is positioned within the nut portion spaced from the injector body by a spring. A clamp is positioned within the clamp portion, which may be remotely located on a hub for connection with the injector body. A screw extends through the opening in the clamp, a portion of the injector body, the spring and into a connection portion of the nut. Gas distribution assemblies and processing chambers incorporating the gas injector unit are also described.