公开(公告)号：US20170040198A1

公开(公告)日：2017-02-09

申请号：US15212695

申请日：2016-07-18

Applicant: Applied Materials, Inc.

Inventor： Xing LIN ,  Jianhua ZHOU ,  Zheng John YE ,  Jian CHEN ,  Juan Carlos ROCHA-ALVAREZ

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01J37/32715 ,  H01L21/67103 ,  H01L21/68735

Abstract: Embodiments of the present disclosure provide an improved electrostatic chuck for supporting a substrate. The electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the tabs are disposed around the circumference of the chuck body, an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs, and an RF power source coupled to the electrode through a first electrical connection.

Abstract translation: 本公开的实施例提供了用于支撑衬底的改进的静电吸盘。 静电卡盘包括联接到支撑杆的卡盘主体，卡盘主体具有基板支撑表面，从卡盘主体的基板支撑表面突出的多个突片，其中突片围绕卡盘主体的圆周设置， 嵌入在所述卡盘主体内的电极，所述电极从所述卡盘主体的中心径向延伸到超过所述多个突片的区域，以及通过第一电连接与所述电极连接的RF电源。