公开(公告)号：US20190284692A1

公开(公告)日：2019-09-19

申请号：US16356681

申请日：2019-03-18

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  David Masayuki ISHIKAWA

IPC: C23C16/455

Abstract: A gas distribution assembly for applying a coating on an interior of a plurality of components includes a support with a plurality of component cavities formed within the support. Each component cavity corresponds to a respective component to fluidly couple with an interior of the respective component. A first gas source flow line is fluidly coupled with each of the component cavities to provide a first gas from a first gas source to each of the component cavities, and a second gas source flow line is fluidly coupled with each of the component cavities to provide a second gas from a second gas source to each of the component cavities.

公开(公告)号：US20190284686A1

公开(公告)日：2019-09-19

申请号：US16356688

申请日：2019-03-18

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/30 ,  C23C16/455 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. In one or more embodiments, a method for depositing a coating on an aerospace component includes exposing an aerospace component to a first precursor and a first reactant to form a first deposited layer on a surface of the aerospace component by a chemical vapor deposition (CVD) process or a first atomic layer deposition (ALD) process and exposing the aerospace component to a second precursor and a second reactant to form a second deposited layer on the first deposited layer by a second ALD process, where the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US20220298920A1

公开(公告)日：2022-09-22

申请号：US17832568

申请日：2022-06-03

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: F01D5/28 ,  C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D9/02 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28

Abstract: Methods for forming protective coatings on aerospace components are provided. In one or more embodiments, the method includes exposing an aerospace component to a first precursor and a first reactant to form a first deposited layer on a surface of the aerospace component by a first deposition process (e.g., CVD or ALD), and exposing the aerospace component to a second precursor and a second reactant to form a second deposited layer on the first deposited layer by a second deposition process. The first deposited layer and the second deposited layer have different compositions from each other. The method also includes repeating the first deposition process and the second deposition process to form a nanolaminate film stack having from 2 pairs to about 1,000 pairs of the first deposited layer and the second deposited layer consecutively deposited on each other.

公开(公告)号：US20210062324A1

公开(公告)日：2021-03-04

申请号：US16995662

申请日：2020-08-17

Applicant: Applied Materials, Inc.

Inventor： David Masayuki ISHIKAWA ,  Jonathan FRANKEL ,  Joseph YUDOVSKY ,  David Alexander BRITZ

IPC: C23C14/30 ,  C23C14/54 ,  C23C14/52 ,  H01J37/305

Abstract: Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.

公开(公告)号：US20210062326A1

公开(公告)日：2021-03-04

申请号：US16995661

申请日：2020-08-17

Applicant: Applied Materials, Inc.

Inventor： David Masayuki ISHIKAWA ,  Jonathan FRANKEL ,  Joseph YUDOVSKY ,  David Alexander BRITZ

IPC: C23C14/54 ,  G01B11/06 ,  G01J5/00 ,  C23C14/30 ,  C23C14/52 ,  H01J37/305 ,  H01J37/22 ,  G02B21/00 ,  G02B21/06

Abstract: Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.

公开(公告)号：US20200240018A1

公开(公告)日：2020-07-30

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.