公开(公告)号：US20210254222A1

公开(公告)日：2021-08-19

申请号：US17313847

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/00 ,  F01D5/28 ,  F01D5/18 ,  C23C16/455

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof and can have a thickness from 1 nm to 3,000 nm.

公开(公告)号：US20190148131A1

公开(公告)日：2019-05-16

申请号：US16248080

申请日：2019-01-15

Applicant: Applied Materials, Inc.

Inventor： Abhishek DUBE ,  Schubert S. CHU ,  Jessica S. KACHIAN ,  David THOMPSON ,  Jeffrey ANTHIS

IPC: H01L21/02 ,  H01J37/32 ,  H01L21/283 ,  C23C16/04 ,  C23C16/52 ,  C23C16/455

Abstract: Methods and apparatus for processing a substrate are described herein. Methods for passivating dielectric materials include forming alkyl silyl moieties on exposed surfaces of the dielectric materials. Suitable precursors for forming the alkyl silyl moieties include (trimethylsilyl)pyrrolidine, aminosilanes, and dichlorodimethylsilane, among others. A capping layer may be selectively deposited on source/drain materials after passivation of the dielectric materials. Apparatus for performing the methods described herein include a platform comprising a transfer chamber, a pre-clean chamber, an epitaxial deposition chamber, a passivation chamber, and an atomic layer deposition chamber.

公开(公告)号：US20170352531A1

公开(公告)日：2017-12-07

申请号：US15684827

申请日：2017-08-23

Applicant: Applied Materials, Inc.

Inventor： Abhishek DUBE ,  Schubert S. CHU ,  Jessica S. KACHIAN ,  David THOMPSON ,  Jeffrey ANTHIS

IPC: H01L21/02 ,  C23C16/455 ,  C23C16/04 ,  H01L21/283 ,  H01J37/32

CPC classification number: H01L21/0228 ,  C23C16/04 ,  C23C16/45544 ,  C23C16/52 ,  H01J37/32009 ,  H01J37/32357 ,  H01J37/32522 ,  H01J37/32899 ,  H01J2237/334 ,  H01L21/02049 ,  H01L21/02057 ,  H01L21/0217 ,  H01L21/02172 ,  H01L21/02175 ,  H01L21/283 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/32 ,  H01L21/67167 ,  H01L21/67207 ,  H01L21/67745

Abstract: Methods and apparatus for processing a substrate are described herein. Methods for passivating dielectric materials include forming alkyl silyl moieties on exposed surfaces of the dielectric materials. Suitable precursors for forming the alkyl silyl moieties include (trimethylsilyl)pyrrolidine, aminosilanes, and dichlorodimethylsilane, among others. A capping layer may be selectively deposited on source/drain materials after passivation of the dielectric materials. Apparatus for performing the methods described herein include a platform comprising a transfer chamber, a pre-clean chamber, an epitaxial deposition chamber, a passivation chamber, and an atomic layer deposition chamber.

公开(公告)号：US20230184119A1

公开(公告)日：2023-06-15

申请号：US18106859

申请日：2023-02-07

Applicant: Applied Materials, Inc.

Inventor： Thomas KNISLEY ,  Mark SALY ,  David Alexander BRITZ ,  David THOMPSON

IPC: F01D5/28 ,  C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D9/02 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28

CPC classification number: F01D5/288 ,  C23C16/45553 ,  C23C16/45555 ,  C23C16/34 ,  C23C16/405 ,  C23C16/45529 ,  C23C16/30 ,  C23C16/56 ,  F01D5/286 ,  F01D9/02 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28 ,  C07F11/005

Abstract: Protected aerospace components are provided and contain a nanolaminate film stack disposed on a surface of an aerospace component, where the nanolaminate film stack comprises alternating layers of a chromium-containing layer and a second deposited layer. The chromium-containing layer can include metallic chromium, chromium oxide, chromium nitride, chromium carbide, chromium silicide, or any combination thereof.

公开(公告)号：US20210262099A1

公开(公告)日：2021-08-26

申请号：US17313858

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/00 ,  F01D5/28 ,  F01D5/18 ,  C23C16/455

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof.

公开(公告)号：US20200240018A1

公开(公告)日：2020-07-30

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US20190330746A1

公开(公告)日：2019-10-31

申请号：US16283567

申请日：2019-02-22

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/04 ,  C23C16/40 ,  C23C14/08 ,  F01D5/28

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof, and is from 1 nm to 3 microns in thickness.

公开(公告)号：US20230010568A1

公开(公告)日：2023-01-12

申请号：US17719502

申请日：2022-04-13

Applicant: Applied Materials, Inc.

Inventor： Suketu PARIKH ,  Mihaela A. BALSEANU ,  Bhaskar Jyoti BHUYAN ,  Ning LI ,  Mark Joseph SALY ,  Aaron Michael DANGERFIELD ,  David THOMPSON ,  Abhijit B. MALLICK

IPC: H01L21/768 ,  H01L21/02 ,  H01L21/311

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method of processing a substrate comprises a) removing oxide from a metal layer disposed in a dielectric layer on the substrate disposed in a processing chamber, b) selectively depositing a self-assembled monolayer (SAM) on the metal layer using atomic layer deposition, c) depositing a precursor while supplying water to form one of an aluminum oxide (AlO) layer on the dielectric layer or a low-k dielectric layer on the dielectric layer, d) supplying at least one of hydrogen (H2) or ammonia (NH3) to remove the self-assembled monolayer (SAM), and e) depositing one of a silicon oxycarbonitride (SiOCN) layer or a silicon nitride (SiN) layer atop the metal layer and the one of the aluminum oxide (AlO) layer on the dielectric layer or the low-k dielectric layer on the dielectric layer.

公开(公告)号：US20210292901A1

公开(公告)日：2021-09-23

申请号：US17331473

申请日：2021-05-26

Applicant: Applied Materials, Inc.

Inventor： Thomas KNISLEY ,  Mark SALY ,  David Alexander BRITZ ,  David THOMPSON

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Methods for depositing protective coatings on aerospace components are provided and include sequentially exposing the aerospace component to a chromium precursor and a reactant to form a chromium-containing layer on a surface of the aerospace component by an atomic layer deposition process. The chromium-containing layer contains metallic chromium, chromium oxide, chromium nitride, chromium carbide, chromium silicide, or any combination thereof.

公开(公告)号：US20190284686A1

公开(公告)日：2019-09-19

申请号：US16356688

申请日：2019-03-18

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/30 ,  C23C16/455 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Embodiments of the present disclosure generally relate to protective coatings on an aerospace component and methods for depositing the protective coatings. In one or more embodiments, a method for depositing a coating on an aerospace component includes exposing an aerospace component to a first precursor and a first reactant to form a first deposited layer on a surface of the aerospace component by a chemical vapor deposition (CVD) process or a first atomic layer deposition (ALD) process and exposing the aerospace component to a second precursor and a second reactant to form a second deposited layer on the first deposited layer by a second ALD process, where the first deposited layer and the second deposited layer have different compositions from each other.