公开(公告)号：US09708709B2

公开(公告)日：2017-07-18

申请号：US14037719

申请日：2013-09-26

Applicant: Applied Materials, Inc.

Inventor： Kengo Ohashi ,  Takao Hashimoto ,  Shinobu Abe

IPC: B08B7/04 ,  B08B9/00 ,  B08B3/00 ,  C23C16/44 ,  H01J37/32

CPC classification number: C23C16/4405 ,  H01J37/32449 ,  H01J37/32862

Abstract: The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports and the cleaning gas is forced to the corners since the shadow frame supports do not extend to the corners.