公开(公告)号：US20240420919A1

公开(公告)日：2024-12-19

申请号：US18210524

申请日：2023-06-15

Applicant: Applied Materials, Inc.

Inventor： Aaron P. WEBB ,  Krag R. SENIOR ,  Chris CZAJKA ,  Charles T. CARLSON ,  Jason M. SCHALLER

IPC: H01J37/30 ,  H01J37/317 ,  H05H9/04

Abstract: An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.

公开(公告)号：US20240179828A1

公开(公告)日：2024-05-30

申请号：US18431579

申请日：2024-02-02

Applicant: Applied Materials, Inc.

Inventor： David T. BLAHNIK ,  Charles T. CARLSON ,  Robert B. VOPAT ,  Frank SINCLAIR ,  Paul J. MURPHY ,  Krag R. SENIOR

IPC: H05H7/22

CPC classification number: H05H7/22 ,  H05H2007/222

Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.