公开(公告)号：US20250101575A1

公开(公告)日：2025-03-27

申请号：US18371708

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Yaoying ZHONG ,  Siew Kit HOI ,  Haomin XU ,  Li Ying CHOO ,  Xiao TAN ,  Jay Min SOH

IPC: C23C16/04 ,  C23C16/12

Abstract: A method for depositing a film layer on a substrate incorporates ion flux control to alter sputtering atom trajectories. A method may include flowing argon gas around a periphery of the substrate with a surface of the substrate having a plurality of structures with sidewalls and an edge region containing edge structures near the periphery of the substrate, forming a plasma to ionize the argon gas to form Ar+ ion flux to induce sputtering of aluminum to generate aluminum atoms for deposition on the substrate, generating an AC bias on the substrate to increase the Ar+ ion flux density at the edge region of the substrate to alter aluminum atom trajectories striking the edge region, and heating the substrate to increase mobility of the aluminum atoms deposited on the edge structures.