公开(公告)号：US11367614B2

公开(公告)日：2022-06-21

申请号：US16929357

申请日：2020-07-15

Applicant: Applied Materials, Inc.

Inventor： Jinrui Guo ,  Jingmei Liang ,  Praket P. Jha ,  Li Zhang

IPC: H01L21/02 ,  C23C16/40 ,  C23C16/02 ,  C23C16/34

Abstract: Methods for forming a smooth ultra-thin flowable CVD film by using a surface treatment on a substrate surface before flowable CVD film deposition improves the uniformity and overall film smoothness. The flowable CVD film can be cured by any suitable curing process to form a smooth flowable CVD film.

公开(公告)号：US20210028013A1

公开(公告)日：2021-01-28

申请号：US16929357

申请日：2020-07-15

Applicant: Applied Materials, Inc.

Inventor： Jinrui Guo ,  Jingmei Liang ,  Praket P. Jha ,  Li Zhang

IPC: H01L21/02 ,  C23C16/02 ,  C23C16/34 ,  C23C16/40

Abstract: Methods for forming a smooth ultra-thin flowable CVD film by using a surface treatment on a substrate surface before flowable CVD film deposition improves the uniformity and overall film smoothness. The flowable CVD film can be cured by any suitable curing process to form a smooth flowable CVD film.