公开(公告)号：US09263078B2

公开(公告)日：2016-02-16

申请号：US14029248

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Steven Verhaverbeke ,  Omkaram Nalamasu ,  Majeed A. Foad ,  Mahalingam Venkatesan ,  Nety M. Krishna

IPC: C23C14/48 ,  C23C14/04 ,  G11B5/84 ,  C23C14/58 ,  C23C14/18 ,  G11B5/855

CPC classification number: G11B5/84 ,  C23C14/185 ,  C23C14/48 ,  C23C14/5826 ,  C23C14/5833 ,  G11B5/855 ,  H01J2237/3365

Abstract: A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.