公开(公告)号：US20140158048A1

公开(公告)日：2014-06-12

申请号：US14179143

申请日：2014-02-12

Applicant: APPLIED MATERIALS, INC.

Inventor： Maosheng ZHAO ,  Juan Carlos ROCHA- ALVAREZ ,  Inna SHMURUN ,  Soovo SEN ,  Mao D. LIM ,  Shankar VENKATARAMAN ,  Ju-Hyung LEE

IPC: C23C16/44

CPC classification number: C23C16/4405 ,  C23C16/458 ,  C23C16/46 ,  H01J37/32082 ,  H01J37/32862 ,  H01L21/67103

Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

Abstract translation: 本发明是一种方法和装置，该方法和设备使用在由电极与腔室的反应体积分离的气体混合容积中的等离子体通电的清洁气体来清洁化学气相沉积（CVD）室。 在一个实施例中，RF功率源耦合到室的盖，而开关用于将喷头连接到接地端子或RF功率源。

公开(公告)号：US20170121813A1

公开(公告)日：2017-05-04

申请号：US15408065

申请日：2017-01-17

Applicant: Applied Materials, Inc.

Inventor： Maosheng ZHAO ,  Juan Carlos ROCHA-ALVAREZ ,  Inna SHMURUN ,  Soovo SEN ,  Mao D. LIM ,  Shankar VENKATARAMAN ,  Ju-Hyung LEE

IPC: C23C16/44 ,  C23C16/458 ,  H01L21/67 ,  C23C16/46

CPC classification number: C23C16/4405 ,  C23C16/458 ,  C23C16/46 ,  H01J37/32082 ,  H01J37/32862 ,  H01L21/67103

Abstract: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.