公开(公告)号：US20210328146A1

公开(公告)日：2021-10-21

申请号：US16335231

申请日：2018-04-03

Applicant: Applied Materials, Inc.

Inventor： Matthias HEYMANNS ,  Tommaso VERCESI ,  Stefan BANGERT ,  Ulrich OLDENDORF ,  Achim HUWIG

IPC: H01L51/00 ,  C23C14/24 ,  C23C14/56 ,  C23C14/04 ,  H01L51/56

Abstract: An apparatus for carrier alignment in a vacuum chamber is described. The apparatus includes a support extending in a first direction in the vacuum chamber, a magnetic levitation system configured to transport a first carrier in the first direction in the vacuum chamber, the magnetic levitation system comprising at least one magnet unit, and an alignment system for aligning the first carrier. The at least one magnet unit and the alignment system are rigidly fixed to the support. Further, a vacuum system and a method of aligning a carrier are described.

公开(公告)号：US20210328147A1

公开(公告)日：2021-10-21

申请号：US16340372

申请日：2018-04-03

Applicant: Applied Materials, Inc.

Inventor： Tommaso VERCESI ,  Matthias HEYMANNS

IPC: H01L51/00 ,  C23C14/56 ,  C23C14/04 ,  C23C14/24 ,  C23C14/50 ,  H01L51/56

Abstract: A carrier for supporting a substrate or a mask in a vacuum chamber in or parallel to a first plane is provided. The carrier comprises a clamping device for fixing the carrier to an aligning device and a mechanical motion element connecting the clamping device to the carrier, the mechanical motion element allowing for relative movement of the clamping device and the carrier for at least one degree of freedom and providing a fixed connection between the clamping device and the carrier for at least another degree of freedom.

公开(公告)号：US20210340663A1

公开(公告)日：2021-11-04

申请号：US16329123

申请日：2018-04-03

Applicant: Matthias HEYMANNS ,  Jens GRÖLS ,  Applied Materials, Inc.

Inventor： Matthias HEYMANNS ,  Jens GRÖLS

IPC: C23C14/04 ,  C23C14/54 ,  C23C14/24 ,  C23C14/50 ,  C23C14/12

Abstract: An apparatus for processing a substrate in a vacuum chamber is described. The apparatus includes a first carrier transport system for transporting a first carrier along a first transport path in a first direction and a second carrier transport system for transporting a second carrier along a second transport path in the first direction. Further, the apparatus includes a measurement system for measuring a distance between the first carrier and the second carrier. The distance is perpendicular to the first direction.

公开(公告)号：US20210335640A1

公开(公告)日：2021-10-28

申请号：US16478045

申请日：2018-07-26

Applicant: Matthias HEYMANNS ,  Applied Materials, Inc.

Inventor： Matthias HEYMANNS

IPC: H01L21/677 ,  H01L21/68 ,  H01L21/683 ,  B25J9/02 ,  B25J9/10 ,  C23C14/50 ,  C23C14/04 ,  C23C14/12

Abstract: A holding device for holding a carrier or a component in a vacuum chamber is described. The holding device includes one or more electric controllable holding elements, a housing for at least partially housing the one or more electric controllable holding elements, the housing having a reception for the one or more electric controllable holding elements, a sealing for providing an air-tight sealing between the housing and the one or more electric controllable holding elements being arranged in the reception; and an air-tight connection for an electric supply line for the one or more electric controllable holding elements. Further, a method of producing a holding device, an apparatus for handling a carrier in a vacuum chamber, and a vacuum deposition system are described.

公开(公告)号：US20200251691A1

公开(公告)日：2020-08-06

申请号：US15761064

申请日：2017-04-12

Applicant: Applied Materials, Inc.

Inventor： Matthias HEYMANNS

IPC: H01L51/56 ,  C23C14/04

Abstract: An apparatus for vacuum processing of a substrate is described. The apparatus includes a vacuum chamber, a substrate transport assembly, a mask transport assembly, and an alignment system having an actuator and a mechanical isolation element between the actuator and the vacuum chamber.

公开(公告)号：US20200083452A1

公开(公告)日：2020-03-12

申请号：US15743614

申请日：2017-02-24

Applicant: Applied Materials, Inc.

Inventor： Matthias HEYMANNS ,  Stefan BANGERT ,  Oliver HEIMEL ,  Andreas SAUER ,  Sebastian Gunther ZANG

IPC: H01L51/00 ,  C23C14/04 ,  C23C14/56 ,  H01L51/56

Abstract: The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a second track arrangement (130) configured for transportation of a mask carrier (140), and a holding arrangement configured for positioning the substrate carrier (120) and the mask carrier (140) with respect to each other. The first track arrangement (110) includes a first portion configured to support the substrate carrier (120) at a first end (12) of the substrate (10) and a second portion configured to support the substrate carrier (120) at a second end (14) of the substrate (10) opposite the first end (12) of the substrate (10). The second track arrangement (120) includes a further first portion configured to support the mask carrier (140) at a first end (22) of a mask (20) and a further second portion configured to support the mask carrier (140) at a second end (24) of the mask (20) opposite the first end (22) of the mask (20). A first distance (D) between the first portion and the second portion of the first track arrangement (110) and a second distance (D′) between the further first portion and the further second portion of the second track arrangement (130) are essentially the same.