公开(公告)号：US20200227637A1

公开(公告)日：2020-07-16

申请号：US15756550

申请日：2017-03-17

申请人： Applied Materials, Inc.

发明人： Sebastian Gunther ZANG ,  Andreas SAUER ,  Oliver HEIMEL

IPC分类号： H01L51/00 ,  C23C14/24 ,  C23C14/56 ,  H01L51/56

摘要： The present disclosure provides a deposition apparatus for a vacuum deposition process. The deposition apparatus includes a vacuum chamber, a movable deposition source arranged in the vacuum chamber, and a supply arrangement providing a supply passage for media supply lines for the movable deposition source, wherein the supply arrangement comprises an axially deflectable element.

公开(公告)号：US20200165721A1

公开(公告)日：2020-05-28

申请号：US16075914

申请日：2016-02-12

申请人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK ,  Applied Materials, Inc.

发明人： Neil MORRISON ,  Jürgen HENRICH ,  Florian RIES ,  Tobias STOLLEY ,  Andreas SAUER ,  Wolfgang BUSCHBECK

IPC分类号： C23C14/56 ,  C23C16/54 ,  B65G39/18 ,  B05C9/14 ,  B05C1/08 ,  C23C16/458 ,  C23C16/511

摘要： A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

公开(公告)号：US20220356028A1

公开(公告)日：2022-11-10

申请号：US17307216

申请日：2021-05-04

申请人： Applied Materials, Inc.

发明人： Andreas SAUER ,  Annemarie HLADIK ,  Bernhard KÖHLER ,  Thomas DEPPISCH ,  Claire ARMSTRONG ,  Wolfgang BUSCHBECK

IPC分类号： B65H27/00 ,  B65H18/14 ,  B65H23/038

摘要： A roller for transporting a flexible substrate is described. The roller includes a main body having a plurality of gas supply slits provided in an outer surface of the main body. The plurality of gas supply slits extends in a direction of a central rotation axis of the roller. Further, the roller includes a sleeve provided circumferentially around and in contact with the main body. The sleeve has a plurality of gas outlets extending in a radial direction (R) and being provided above the plurality of gas supply slits.

公开(公告)号：US20200083452A1

公开(公告)日：2020-03-12

申请号：US15743614

申请日：2017-02-24

申请人： Applied Materials, Inc.

发明人： Matthias HEYMANNS ,  Stefan BANGERT ,  Oliver HEIMEL ,  Andreas SAUER ,  Sebastian Gunther ZANG

IPC分类号： H01L51/00 ,  C23C14/04 ,  C23C14/56 ,  H01L51/56

摘要： The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a second track arrangement (130) configured for transportation of a mask carrier (140), and a holding arrangement configured for positioning the substrate carrier (120) and the mask carrier (140) with respect to each other. The first track arrangement (110) includes a first portion configured to support the substrate carrier (120) at a first end (12) of the substrate (10) and a second portion configured to support the substrate carrier (120) at a second end (14) of the substrate (10) opposite the first end (12) of the substrate (10). The second track arrangement (120) includes a further first portion configured to support the mask carrier (140) at a first end (22) of a mask (20) and a further second portion configured to support the mask carrier (140) at a second end (24) of the mask (20) opposite the first end (22) of the mask (20). A first distance (D) between the first portion and the second portion of the first track arrangement (110) and a second distance (D′) between the further first portion and the further second portion of the second track arrangement (130) are essentially the same.

公开(公告)号：US20200017957A1

公开(公告)日：2020-01-16

申请号：US16485573

申请日：2017-03-17

申请人： Sebastian Gunther ZANG ,  Andreas SAUER ,  Applied Materials, Inc.

发明人： Sebastian Gunther ZANG ,  Andreas SAUER

IPC分类号： C23C14/56 ,  C23C16/44 ,  F16K31/08 ,  H01L51/56 ,  H01L51/00

摘要： The present disclosure provides an apparatus (100) for vacuum processing of a substrate (10). The apparatus (100) includes a first vacuum region (110), a second vacuum region (120), an opening (130) between the first vacuum region (100) and the second vacuum region (130), and a closing arrangement (140) for closing the opening (130). The closing arrangement includes one or more first permanent magnets, one or more second permanent magnets, and a magnet device configured to change a magnetization of the one or more first permanent magnets.

公开(公告)号：US20200016557A1

公开(公告)日：2020-01-16

申请号：US15764311

申请日：2017-04-07

申请人： Andre BRÜNING ,  Andreas SAUER ,  Applied Materials, Inc.

发明人： Andre BRÜNING ,  Andreas SAUER

IPC分类号： B01J3/02 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H01L51/56

摘要： A supply line guide for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement including a plurality of connected elements, wherein the connected elements are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube provided around the guiding arrangement.

公开(公告)号：US20220228251A1

公开(公告)日：2022-07-21

申请号：US17563242

申请日：2021-12-28

申请人： Applied Materials, Inc.

发明人： Andreas SAUER ,  Volker HACKER ,  Thomas DEPPISCH ,  Ralf SCHEIDT

IPC分类号： C23C14/24 ,  G01F11/28 ,  H01M4/04 ,  H01M4/38 ,  H01M10/052

摘要： A vapor deposition apparatus is provided. The vapor deposition apparatus includes a tank for providing a liquefied material, a first unit having an alterable first volume, the first unit including a first actuator and including a first line to be in fluid communication with the tank. Further, the vapor deposition apparatus includes a second unit having an alterable second volume, the second unit including a second actuator and including a second line to be in fluid communication with the tank. The vapor deposition apparatus includes an evaporation arrangement, the evaporation arrangement being in fluid communication with the first unit and the second unit. The first actuator and the second actuator are configured to alternatingly provide a force to the alterable first volume and the alterable second volume for providing the liquefied material to the evaporation arrangement.

公开(公告)号：US20220090713A1

公开(公告)日：2022-03-24

申请号：US17025268

申请日：2020-09-18

申请人： Applied Materials, Inc.

发明人： Lukas KREMSER ,  Andreas SAUER ,  Stefan BANGERT

IPC分类号： F16L23/20 ,  F16L23/032 ,  F16L23/036

摘要： A flanged joint is described. The flanged joint has a first flange member with a first sealing surface and a second flange member with a second sealing surface. The flanged joint further has a hollow-metal gasket between the first flange member and the second flange member, and a spacer between the first flange member and the second flange member. The spacer defines a minimum distance between the first flange member and the second flange member. The flanged joint can be configured to seal a metal-conveying volume.

公开(公告)号：US20200243768A1

公开(公告)日：2020-07-30

申请号：US15760661

申请日：2017-03-17

申请人： Applied Materials, Inc.

发明人： Sebastian Gunther ZANG ,  Andreas SAUER

IPC分类号： H01L51/00 ,  C23C14/04 ,  C23C14/56 ,  C23C16/04 ,  C23C16/54 ,  H01L21/67 ,  H01L21/677

摘要： A method of operating a vacuum processing system with a main transportation path along which substrates can be transported in a main transportation direction is described. The method includes routing a substrate out of the main transportation path into a first deposition module for depositing a first material on the substrate; routing the substrate out of the main transportation path into a second deposition module for depositing a second material on the substrate; and routing the substrate out of the main transportation path into one or more further deposition modules for depositing one or more further materials on the substrate. Further, various methods of operating one or more rotation modules of vacuum processing system configured for depositing two or more materials on a plurality of substrates are described.

公开(公告)号：US20150110960A1

公开(公告)日：2015-04-23

申请号：US14254695

申请日：2014-04-16

申请人： APPLIED MATERIALS, INC.

发明人： Andreas SAUER ,  Jürgen HENRICH ,  Thomas DEPPISCH ,  Dirk WAGNER

IPC分类号： B05D1/00 ,  B05C1/00 ,  H01L21/677

CPC分类号： B05D1/60 ,  B05C1/003 ,  C23C16/46 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67739

摘要： A deposition arrangement for depositing a material on a substrate is described. The deposition arrangement includes a vacuum chamber; a roller device within the vacuum chamber; and an electrical heating device within the roller device, wherein the heating device comprises a first end and a second end, and wherein the heating device is held at the first end and at the second end. Also, a method for heating a substrate in a vacuum deposition arrangement is described.

摘要翻译： 描述了用于在衬底上沉积材料的沉积装置。 沉积装置包括真空室; 真空室内的滚筒装置; 以及在所述辊装置内的电加热装置，其中所述加热装置包括第一端和第二端，并且其中所述加热装置保持在所述第一端和所述第二端。 另外，描述了一种在真空沉积装置中加热衬底的方法。