公开(公告)号：US20180044781A1

公开(公告)日：2018-02-15

申请号：US15349433

申请日：2016-11-11

Applicant: Applied Materials, Inc.

Inventor： Michael STOWELL ,  Viachslav BABAYAN ,  Jingjing LIU ,  Zhong Qiang HUA

IPC: C23C14/34 ,  H01J37/34 ,  C23C14/35 ,  H01L21/683

Abstract: Embodiments presented herein relate to a pulse control system for a substrate processing system. The pulse control system includes a power source, a system controller, and a pulse shape controller. The pulse shape controller is coupled to the power source and in communication with the system controller. The pulse shape controller includes a first switch assembly and a second switch assembly. The first switch assembly includes a first switch having a first end and a second end. The first switch is configurable between an open state and a closed state. The second switch assembly includes a second switch having a first end and a second end. The first switch is in the closed state and the second switch is in the open state. The first switch in the closed state is configured to allow a pulse supplied by the power source to transfer through the pulse shape controller.