公开(公告)号：US20210216019A1

公开(公告)日：2021-07-15

申请号：US17217799

申请日：2021-03-30

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Muhammet POYRAZ ,  Qin ZHONG ,  Pacha MONGKOLWONGROJN

IPC: G03F7/20

Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.

公开(公告)号：US20200264514A1

公开(公告)日：2020-08-20

申请号：US16277805

申请日：2019-02-15

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Muhammet POYRAZ ,  Qin ZHONG ,  Pacha MONGKOLWONGROJN

IPC: G03F7/20

Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.