公开(公告)号：US20230060141A1

公开(公告)日：2023-03-02

申请号：US17977794

申请日：2022-10-31

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv GADGIL ,  Sumit Subhash PATANKAR ,  Nathan Arron DAVIS ,  Michael J. COUGHLIN ,  Allen L. D'AMBRA

IPC: B24B53/017 ,  B24B37/34 ,  C09D5/00 ,  B65D81/32 ,  B05C17/00

Abstract: Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods are shown. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.

公开(公告)号：US20210276144A1

公开(公告)日：2021-09-09

申请号：US16813275

申请日：2020-03-09

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv GADGIL ,  Sumit Subhash PATANKAR ,  Nathan Arron DAVIS ,  Michael J. COUGHLIN ,  Allen L. D'AMBRA

IPC: B24B37/34 ,  B65D81/32 ,  C09D5/00

Abstract: Embodiments herein relate to chemically impregnated applicators which may be used to provide hydrophobic surfaces on CMP system components and related application methods. In one embodiment, a method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.