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公开(公告)号：US20250157833A1
公开(公告)日：2025-05-15
申请号：US18510336
申请日：2023-11-15
Applicant: Applied Materials, Inc.
Inventor： Tyler ROCKWELL , Kevin T. RYAN , Nicholas Scott CHAMBERLAIN , Costel BILOIU
IPC: H01L21/67
Abstract: An ion processing system including a process chamber containing a platen for supporting a semiconductor substrate, the platen mounted on a movable shaft, an ion source connected to the process chamber and adapted to project an ion beam toward the platen, and at least one cooled plate located within the process chamber for collecting byproducts of etching and deposition processes.
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