公开(公告)号：US20250021832A1

公开(公告)日：2025-01-16

申请号：US18221301

申请日：2023-07-12

Applicant: Applied Materials, Inc.

Inventor： Bharath Ram Sundar ,  Jagadeesh Govindaraj ,  Raman Krishnan Nurani ,  Ramachandran Subramanian ,  Nusrat Jahan Chhanda ,  Sundar Narayanan

IPC: G06N5/022

Abstract: A method includes obtaining, by a processing device, first data indicative of substrate generation parameters of a first substrate. The processing device further obtains second data indicative of properties of the first substrate. The processing device further obtains third data indicative of substrate generation parameters of a second substrate. The processing device further receives fourth data indicative of properties of the second substrate. The method further includes providing a user interface (UI). The UI includes a first UI element for presenting a visual depiction of the second data and a second UI element for presenting a visual depiction of the fourth data. The method further includes receiving user input of a classification of the first substrate and the second substrate. The method further includes performing analysis relating the first data and the third data to the user classifications. The method further includes performing a corrective action based on the analysis.

公开(公告)号：US20240086597A1

公开(公告)日：2024-03-14

申请号：US18244787

申请日：2023-09-11

Applicant: Applied Materials, Inc.

Inventor： Sundar Narayanan ,  Samit Barai ,  Nusrat Jahan Chhanda ,  Dheeraj Kumar ,  Pardeep Kumar ,  Anantha R. Sethuraman ,  Raman Krishnan Nurani

IPC: G06F30/27

CPC classification number: G06F30/27

Abstract: A method includes receiving profile data of a plurality of features of a substrate. The method further includes generating a typical profile based on the profile data of the plurality of features. The method further includes generating a first array of features. Each of the first array of features is based on the typical profile. The method further includes providing the first array of features to a process model. The method further includes obtaining first output from the process model based on the first array of features. The method further includes causing performance of a corrective action in view of the first output from the process model.