公开(公告)号：US20020182131A1

公开(公告)日：2002-12-05

申请号：US09872254

申请日：2001-06-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Tony S. Kaushal ,  Shamouil Shamouilian ,  Harshad Borgaonkar ,  Kwok Manus Wong ,  Michael G. Chafin ,  Ashish Bhatnagar

IPC: F28D021/00 ,  B01J035/00 ,  B01J008/02

CPC classification number: H01J37/32844 ,  B01D53/8662 ,  B01D53/885 ,  B01J19/12 ,  B01J19/129 ,  B01J2219/0809 ,  B01J2219/083 ,  B01J2219/0835 ,  B01J2219/0871 ,  B01J2219/0875 ,  B01J2219/0892 ,  C23C16/4412 ,  H01J37/3244 ,  Y02C20/30

Abstract: A substrate processing apparatus has a process chamber with a substrate support, a gas supply to introduce a gas into the chamber, and a gas energizer to energize the gas in the processing of a substrate, thereby generating an effluent gas. A catalytic reactor has an effluent gas inlet to receive the effluent gas and an effluent gas outlet to exhaust treated effluent gas. A heater is adapted to heat the effluent gas in the catalytic reactor. The heated catalytic treatment of the effluent gas abates the hazardous gases in the effluent. An additive gas source and a prescrubber may also be used to further treat the effluent.

Abstract translation: 基板处理装置具有具有基板支撑件的处理室，向室内引入气体的气体供给部，以及在基板的加工中使气体通电的气体增压器，从而产生流出气体。 催化反应器具有用于接收废气的废气入口和用于排出经处理的废气的废气出口。 加热器适于加热催化反应器中的废气。 流出气体的加热催化处理减少流出物中的有害气体。 还可以使用添加气体源和预饱和物来进一步处理流出物。

公开(公告)号：US20030209526A1

公开(公告)日：2003-11-13

申请号：US10141025

申请日：2002-05-07

Applicant: Applied Materials, Inc.

Inventor： Ananda H. Kumar ,  Tetsuya Ishikawa ,  Kwok Manus Wong ,  Farahmand E. Askarinam

IPC: B23K010/00

CPC classification number: H01J37/32009

Abstract: The present invention relates to novel heaters and methods of heating a vacuum chamber, such as a semiconductor wafer plasma processing chamber, using a ceramic igniter array consisting of a plurality of ceramic igniters positioned in a substrate.

Abstract translation: 本发明涉及使用由位于基板中的多个陶瓷点火器组成的陶瓷点火器阵列来加热真空室（例如半导体晶片等离子体处理室）的新型加热器和方法。

公开(公告)号：US20020088797A1

公开(公告)日：2002-07-11

申请号：US09758000

申请日：2001-01-09

Applicant: Applied Materials, Inc.

Inventor： Kartik Ramaswamy ,  Dennis S. Grimard ,  Philip M. Salzman ,  Liang-Guo Wang ,  Kwok Manus Wong

IPC: H05B006/10

CPC classification number: H01L21/67098

Abstract: A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system comprises a transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.

Abstract translation: 导管具有设置在其中的加热系统。 加热系统响应于由感应线圈产生的磁通而产生热量。 加热系统包括转移元件和多个铁磁元件。 传热元件可以在导管内移位以控制产生的热量。

公开(公告)号：US20040212947A1

公开(公告)日：2004-10-28

申请号：US10421473

申请日：2003-04-22

Applicant: Applied Materials, Inc.

Inventor： Andrew Nguyen ,  Wing Lau Cheng ,  Hiroji Hanawa ,  Semyon L. Kats ,  Kartik Ramaswamy ,  Yan Ye ,  Kwok Manus Wong ,  Daniel J. Hoffman ,  Tetsuya Ishikawa ,  Brian C. Lue

IPC: H02H001/00

CPC classification number: H01L21/67109

Abstract: A support for a substrate processing chamber has upper and lower walls that are joined by a peripheral sidewall to define a reservoir. A fluid inlet supplies a heat transfer fluid to the reservoir. In one version, a plurality of protrusions extends into the reservoir to perturb the flow of the heat transfer fluid through the reservoir. In another version, the reservoir is an elongated channel having one or more of (i) serpentine convolutions, (ii) integral fins extending into the channel, (iii) a roughened internal surface, or (iv) a changing cross-section. A fluid outlet discharges the heat transfer fluid from the reservoir.

Abstract translation: 用于衬底处理室的支撑件具有通过周边侧壁连接以限定储存器的上壁和下壁。 流体入口将传热流体供应到储存器。 在一个版本中，多个突起延伸到储存器中以扰乱通过储存器的传热流体的流动。 在另一个版本中，储存器是具有（i）蛇形循环中的一个或多个的细长通道，（ii）延伸到通道中的整体翅片，（iii）粗糙化的内表面，或（iv）变化的横截面。 流体出口从储存器排出传热流体。

公开(公告)号：US20030192646A1

公开(公告)日：2003-10-16

申请号：US10122271

申请日：2002-04-12

Applicant: Applied Materials, Inc.

Inventor： Robert W. Wu ,  Wing L. Cheng ,  You Wang ,  Senh Thach ,  Hamid Noorbakhsh ,  Kwok Manus Wong ,  Jennifer Y. Sun

IPC: C23F001/00 ,  C23C016/00

CPC classification number: H01J37/32623

Abstract: A magnetic assembly for a plasma processing chamber includes an annular housing having a radially outward face and a radially inwardly facing opening, a cover plate to seal the radially inwardly facing opening, and a plurality of magnets in the annular housing. The magnets may be in preassembled modules that abut one another in a ring configuration within the annular housing. A plasma processing chamber using the magnetic assembly includes a substrate support that can fit in an inner radius of the magnetic assembly, a gas supply to maintain process gas at a pressure in the chamber, a gas energizer to energize the process gas, and an exhaust to exhaust the process gas.

Abstract translation: 用于等离子体处理室的磁性组件包括具有径向向外面和径向向内开口的环形壳体，密封径向向内开口的盖板和环形壳体中的多个磁体。 磁体可以在预先组装的模块中，环形壳体内的环形结构彼此邻接。 使用该磁性组件的等离子体处理室包括可以装配在磁性组件的内半径中的基板支撑件，用于将处理气体保持在室内压力的气体供应源，用于激励处理气体的气体增压器和排气 以排出工艺气体。