公开(公告)号：US12249489B2

公开(公告)日：2025-03-11

申请号：US18131997

申请日：2023-04-07

Applicant: Applied Materials, Inc.

Inventor： Yue Chen ,  Jinyu Lu ,  Yongmei Chen ,  Jinxin Fu ,  Zihao Yang ,  Mingwei Zhu ,  Takashi Kuratomi ,  Rami Hourani ,  Ludovic Godet ,  Qun Jing ,  Jingyi Yang ,  David Masayuki Ishikawa

IPC: H01J37/32 ,  H01J7/02

Abstract: A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.