公开(公告)号：US12106943B2

公开(公告)日：2024-10-01

申请号：US17329883

申请日：2021-05-25

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC: H01J37/32

CPC classification number: H01J37/32642 ,  H01J37/32467 ,  H01J37/32724

Abstract: A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US20220384156A1

公开(公告)日：2022-12-01

申请号：US17329883

申请日：2021-05-25

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC: H01J37/32

Abstract: A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.