公开(公告)号：US12106943B2

公开(公告)日：2024-10-01

申请号：US17329883

申请日：2021-05-25

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC: H01J37/32

CPC classification number: H01J37/32642 ,  H01J37/32467 ,  H01J37/32724

Abstract: A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US20220384156A1

公开(公告)日：2022-12-01

申请号：US17329883

申请日：2021-05-25

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC: H01J37/32

Abstract: A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US12191117B2

公开(公告)日：2025-01-07

申请号：US17503334

申请日：2021-10-17

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Solomon Belangedi Basame ,  Kevin R. Anglin ,  Tyler Rockwell

IPC: H01J37/32

Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.

公开(公告)号：US20220020557A1

公开(公告)日：2022-01-20

申请号：US16929626

申请日：2020-07-15

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Costel Biloiu ,  Kevin M. Daniels

IPC: H01J37/08 ,  H01J37/04

Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.

公开(公告)号：US20230124509A1

公开(公告)日：2023-04-20

申请号：US17503334

申请日：2021-10-17

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Solomon Belangedi Basame ,  Kevin R. Anglin ,  Tyler Rockwell

IPC: H01J37/32

Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.

公开(公告)号：US11361935B2

公开(公告)日：2022-06-14

申请号：US17092250

申请日：2020-11-07

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/08 ,  H01J37/32

Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US20210391155A1

公开(公告)日：2021-12-16

申请号：US17160042

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC: H01J37/32

Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

公开(公告)号：US11948781B2

公开(公告)日：2024-04-02

申请号：US17160042

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC: H01J37/32

CPC classification number: H01J37/32788 ,  H01J37/32568

Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

公开(公告)号：US20230197422A1

公开(公告)日：2023-06-22

申请号：US17556390

申请日：2021-12-20

Applicant: Applied Materials, Inc.

Inventor： Kevin T. Ryan ,  Appu Naveen Thomas ,  Adam Calkins ,  Jay R. Wallace ,  Tyler Rockwell ,  Solomon Belangedi Basame ,  Kevin M. Daniels ,  Kevin Richard Verrier

IPC: H01J37/32

CPC classification number: H01J37/32807 ,  H01J37/32422 ,  H01J37/32623

Abstract: A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

公开(公告)号：US11495430B2

公开(公告)日：2022-11-08

申请号：US16929626

申请日：2020-07-15

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Costel Biloiu ,  Kevin M. Daniels

IPC: H01J37/08 ,  H01J37/04

Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.