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公开(公告)号:US20240332058A1
公开(公告)日:2024-10-03
申请号:US18436846
申请日:2024-02-08
Applicant: Applied Materials, Inc.
Inventor: Sathiyamurthi GOVINDASAMY , Harish PENMETHSA , Suresh PALANISAMY
IPC: H01L21/687
CPC classification number: H01L21/68742
Abstract: A support assembly for supporting a substrate in a processing station includes a housing, a pin, a plurality of bearing elements, and a retaining member. The housing includes a bore, a groove formed on an exterior surface of the housing, and a plurality of windows disposed in the groove that intersect the bore. The pin is disposed in the bore and moveable between a retracted position and an extended position. The pin includes a shaft including a plurality of bearing surfaces. The plurality of bearing elements are at least partially disposed in a corresponding window. Each bearing element includes an outer surface configured to engage a corresponding bearing surface of the shaft. The plurality of bearing elements and bearing surfaces cooperate to maintain an angular orientation of the pin as the pin moves between the retracted position and the extended position. The retaining member is disposed in the groove.
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公开(公告)号:US20240282558A1
公开(公告)日:2024-08-22
申请号:US18110668
申请日:2023-02-16
Applicant: Applied Materials, Inc.
Inventor: Sathiyamurthi GOVINDASAMY , Harish V. PENMETHSA , Suresh PALANISAMY , Naresh Kumar ASOKAN , Karunakaran NATARAJ
IPC: H01J37/34
CPC classification number: H01J37/3408 , H01J37/3452 , H01J37/3455 , H01J2237/002
Abstract: Apparatus and methods for improving film uniformity in a physical vapor deposition (PVD) process are provided herein. In some embodiments, a magnetron translation assembly comprises a first linear actuator assembly with a first rail which is aligned in a first direction and a first actuator that is configured to position a first mount along the first rail; a magnet assembly is mounted on the first mount, the magnet assembly constructed and arranged to be rotated about an axis perpendicular to the first rail; and a second linear actuator assembly comprising a second mount that is configured to be positioned along a second rail, which is aligned in a second direction and the first linear actuator assembly is coupled to a mounting surface of the second mount.
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公开(公告)号:US20240376591A1
公开(公告)日:2024-11-14
申请号:US18313733
申请日:2023-05-08
Applicant: Applied Materials, Inc.
IPC: C23C14/50 , H01L21/687
Abstract: Embodiments of the disclosure provided herein include an apparatus for securing a substrate in a plasma processing system. The apparatus includes a clamp assembly having a main clamp, a sub-clamp having a tapered inner edge, a gasket disposed within the sub-clamp, the gasket being proximate to the tapered inner edge having a gasket contact surface configured to contact a substrate, and a leaf spring secured to the sub-clamp by at least one of a plurality of fasteners. In another embodiment, a clamp assembly has a main clamp, a sub-clamp having a tapered inner edge, the sub-clamp secured to the main clamp by a fastener, a gasket having a gasket contact surface, and a compression spring disposed coaxially about the fastener.
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公开(公告)号:US20240263299A1
公开(公告)日:2024-08-08
申请号:US18106365
申请日:2023-02-06
Applicant: Applied Materials, Inc.
Inventor: Karunakaran NATARAJ , Sathiyamurthi GOVINDASAMY , Suresh PALANISAMY , Harish V. PENMETHSA , Naresh Kumar ASOKAN
CPC classification number: C23C14/505 , C23C14/52
Abstract: Apparatus and methods for flipping substrates in vacuum between PVD sputtering of each side for increasing throughput are provided herein. In some embodiments disclosed herein, a module of a processing system for flipping a substrate in vacuum is provided. The module includes a clamp assembly for securing the substrate, a motor assembly coupled to the substrate clamp assembly, for rotating the clamp assembly, a lift pin assembly, and a lift pin actuator for raising and lowering the lift pin assembly.
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