公开(公告)号：US20240282605A1

公开(公告)日：2024-08-22

申请号：US18172149

申请日：2023-02-21

Applicant: Applied Materials, Inc.

Inventor： Rupankar CHOUDHURY ,  Sanjay G. KAMATH ,  Sridhar BACHU

IPC: H01L21/67 ,  F24F13/14 ,  F24F13/32 ,  H01L21/673

CPC classification number: H01L21/6719 ,  F24F13/1413 ,  F24F13/1486 ,  F24F13/32 ,  H01L21/67383 ,  H01L21/67393

Abstract: An apparatus and system for minimizing particle return to the processing area of a processing chamber are disclosed herein. In one example, a particle shield for a semiconductor vacuum processing chamber includes an annular ring, a plurality of rib supports, and a plurality of louver fins. The annular ring has top surface, a bottom surface, and a plurality of cutaways. The top surface has an upper outer portion and a lower inner portion. The plurality of rib supports are disposed on and supported by the lower inner portion. The plurality of louver fins have a truncated conical shape, a bottom surface of the louver fins supported in a recess formed in a top surface of the rib supports. Each of the plurality of louver fins are disposed between adjacent concentric louver fins that have an outer diameter greater than an inner diameter of the outwardly adjacent louver fin.