公开(公告)号：US20210398824A1

公开(公告)日：2021-12-23

申请号：US16946407

申请日：2020-06-19

Applicant: Applied Materials, Inc.

Inventor： Dean C. Hruzek ,  Nir Merry ,  Marek Radko ,  Paul B. Reuter ,  Steven Sansoni ,  Sushant S. Koshti ,  John Joseph Mazzocco ,  Juan Chacin

IPC: H01L21/67 ,  H01L21/677

Abstract: A substrate processing system includes an equipment front end module (EFEM) coupled to a vacuum-based mainframe, the EFEM including multiple interface openings. The system further includes a batch degas chamber attached to the EFEM at an interface opening of the multiple interface openings. The batch degas chamber includes a housing that is sealed to the interface opening of the EFEM. Within the housing is located a cassette configured to hold multiple substrates. A reactor chamber, attached to the housing, is to receive the cassette and perform an active degas process on the multiple substrates. The active degas process removes moisture and contaminants from surfaces of the multiple substrates. An exhaust line is attached to the reactor chamber to provide an exit for the moisture and contaminants.

公开(公告)号：USD893441S1

公开(公告)日：2020-08-18

申请号：US29696587

申请日：2019-06-28

Applicant: APPLIED MATERIALS, INC.

Designer： Shreesha Yogish Rao ,  Mukund Sundararajan ,  Cheng-Hsiung Tsai ,  Manjunatha P. Koppa ,  Steven Sansoni

公开(公告)号：US11047039B2

公开(公告)日：2021-06-29

申请号：US16232496

申请日：2018-12-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Alexander Lerner ,  Kim Vellore ,  Ami Sade ,  Steven Sansoni ,  Andrew Constant ,  Kevin Moraes ,  Roey Shaviv ,  Niranjan Kumar ,  Jeffrey Brodine ,  Michael Karazim

IPC: C23C14/50 ,  C23C14/04 ,  C23C14/24

Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.