公开(公告)号：US20150099432A1

公开(公告)日：2015-04-09

申请号：US14484173

申请日：2014-09-11

Applicant: Applied Materials, Inc.

Inventor： Uday MAHAJAN ,  Rajeev BAJAJ ,  Fred Conrad REDEKER ,  Abdul Wahab MOHAMMED

IPC: B24B41/04 ,  B24B37/34 ,  H01F7/02 ,  B24B37/20

CPC classification number: B24B41/04 ,  B24B37/14 ,  B24B37/20 ,  B24B37/22 ,  B24B37/34 ,  H01F7/0273

Abstract: Embodiments described herein generally relate to devices and methods for magnetic-responsive chemical mechanical polishing. In one embodiment, a device including a support with one or more magnetic field generators formed therein is provided. The magnetic field generators can produce at least one magnetic field. A magnetic-responsive composite is positioned in magnetic connection with the magnetic field generators. When the magnetic-responsive composite receives the magnetic field from the magnetic field generators, the magnetic-responsive composite changes shape.

Abstract translation: 本文描述的实施例一般涉及用于磁响应化学机械抛光的装置和方法。 在一个实施例中，提供了一种包括其中形成有一个或多个磁场产生器的支撑件的装置。 磁场发生器可产生至少一个磁场。 磁响应复合体定位成与磁场发生器磁连接。 当磁响应复合体从磁场发生器接收磁场时，磁响应复合体变形。