公开(公告)号：US10266940B2

公开(公告)日：2019-04-23

申请号：US15050409

申请日：2016-02-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Zhenbin Ge ,  Vivek Gupta ,  Adolph Miller Allen ,  Ryan Hanson

IPC: C23C14/34 ,  C23C14/54 ,  H01J37/32 ,  H03J7/04 ,  H03L7/06

Abstract: In some embodiments a method of depositing a metal-containing layer atop a substrate disposed in a physical vapor deposition (PVD) chamber includes: providing a plasma forming gas to a processing region of the PVD chamber; providing a first amount of RF power to a target assembly disposed opposite the substrate to form a plasma within the processing region of the PVD chamber; sputtering source material from the target assembly to deposit a metal-containing layer onto the substrate, wherein the source material is at a first erosion state; and tuning an auto capacitance tuner coupled to a substrate support while sputtering source material to maintain an ion energy at a surface of the substrate within a predetermined range as the target erodes from the first erosion state to a second erosion state.

公开(公告)号：USD798248S1

公开(公告)日：2017-09-26

申请号：US29530683

申请日：2015-06-18

Applicant: APPLIED MATERIALS, INC.

Designer： Ryan Hanson ,  Zhenbin Ge ,  Vivek Gupta

公开(公告)号：USD825505S1

公开(公告)日：2018-08-14

申请号：US29618685

申请日：2017-09-22

Applicant: APPLIED MATERIALS, INC.

Designer： Ryan Hanson ,  Zhenbin Ge ,  Vivek Gupta

公开(公告)号：US09028659B2

公开(公告)日：2015-05-12

申请号：US13961165

申请日：2013-08-07

Applicant: Applied Materials, Inc.

Inventor： Alan Ritchie ,  Zhenbin Ge ,  Tza-Jing Gung ,  Vivek Gupta

IPC: C23C14/35 ,  H01J37/32 ,  H01J37/34

CPC classification number: C23C14/35 ,  H01J37/3266 ,  H01J37/3408 ,  H01J37/3452

Abstract: Embodiments of magnetrons suitable to provide extended target life in radio frequency (RF) plasmas are provided. In some embodiments, apparatus and methods are provided to control film uniformity while extending the target life in an RF plasma. In some embodiments, the present invention may facilitate one or more of very high target utilization, more uniform metal ionization, and more uniform deposition on a substrate. In some embodiments, a magnetron may include a magnet support member having a center of rotation; and a plurality of magnetic tracks, each track comprising a pair of open loop magnetic poles parallel to and spaced apart from each other, wherein one track is disposed near the center of the magnet support member, and wherein a different track is disposed in a position corresponding to an outer edge of a target material to be deposited on a substrate when installed in the PVD process chamber.

Abstract translation: 提供了适合在射频（RF）等离子体中提供延长的目标寿命的磁控管的实施例。 在一些实施例中，提供了设备和方法来控制膜均匀性，同时延长RF等离子体中的目标寿命。 在一些实施方案中，本发明可以促进在基材上非常高的目标利用，更均匀的金属电离和更均匀的沉积中的一种或多种。 在一些实施例中，磁控管可以包括具有旋转中心的磁体支撑构件; 和多个磁道，每个轨道包括彼此平行并间隔开的一对开环磁极，其中一个轨道设置在磁体支撑构件的中心附近，并且其中不同的轨道设置在一个位置 对应于当安装在PVD处理室中时要沉积在基板上的目标材料的外边缘。