公开(公告)号：US10921721B1

公开(公告)日：2021-02-16

申请号：US16596237

申请日：2019-10-08

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Yifei Wang ,  Yongan Xu ,  Ludovic Godet

IPC: G03F7/20 ,  G03F9/00 ,  G01D5/38 ,  G02B5/18

Abstract: Embodiments of the present disclosure include measurement systems and grating pattern arrays. The measurement systems include multiple subsystems for creating diffraction patterns or magnified real images of grating regions on a substrate. The measurements systems are configured to reflect and transmit light, and the reflected and transmitted beams create diffraction patterns and enlarged images. The diffraction patterns and images provide information on grating pitch and angles of grating regions. Grating pattern arrays disposed on a substrate include main regions and reference regions. The reference regions are used to locate corresponding main regions. The measurement systems do not include a rotating stage, and thus precise control of rotation of a stage is not needed.

公开(公告)号：US10801890B1

公开(公告)日：2020-10-13

申请号：US16539930

申请日：2019-08-13

Applicant: Applied Materials, Inc.

Inventor： Jinxin Fu ,  Yifei Wang ,  Ian Matthew McMackin ,  Rutger Meyer Timmerman Thijssen ,  Ludovic Godet

IPC: G01J3/30 ,  G01J3/18 ,  G02B7/04 ,  G01J3/02 ,  G01J3/42

Abstract: Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength λlaser to a first zone of a first substrate at the fixed beam angle θ0 and the maximum orientation angle ϕmax, obtaining a displacement angle Δθ, determining a target maximum beam angle θt-max, wherein θt-max=θ0+Δθ, and determining a test grating pitch Pt-grating by a modified grating pitch equation Pt-grating=λlaser/(sin θt-max+sin θ0). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.

公开(公告)号：US12159392B2

公开(公告)日：2024-12-03

申请号：US17753555

申请日：2020-09-14

Applicant: Applied Materials, Inc.

Inventor： Yongan Xu ,  Chan Juan Xing ,  Jinxin Fu ,  Yifei Wang ,  Ludovic Godet

IPC: G06T7/33 ,  G06T7/00

Abstract: Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.