公开(公告)号：US20220301196A1

公开(公告)日：2022-09-22

申请号：US17209086

申请日：2021-03-22

Applicant: Applied Materials Israel Ltd.

Inventor： David ULIEL ,  Yan AVNIEL ,  Bobin Mathew SKARIA ,  Oz FOX-KAHANA ,  Gal Daniel GUTTERMAN ,  Atai BALDINGER ,  Murad MUSLIMANY ,  Erez LIDOR

IPC: G06T7/30 ,  G06T5/50 ,  G06T7/00 ,  G06K9/62 ,  H01J37/26

Abstract: There is provided a system and method of examination of a semiconductor specimen, comprising: obtaining a sequence of frames of an area of the specimen acquired by an electron beam tool configured to scan the area from a plurality of directions, the sequence comprising a plurality of sets of frames each acquired from a respective direction; and registering the plurality of sets of frames and generating an image of the specimen based on result of the registration, comprising: performing, for each direction, a first registration among the set of frames acquired therefrom, and combining the registered set of frames to generate a first composite frame, giving rise to a plurality of first composite frames respectively corresponding to the plurality of directions; and performing a second registration among the plurality of first composite frames, and combining the registered plurality of first composite frames to generate the image of the specimen.