公开(公告)号：US20150310600A1

公开(公告)日：2015-10-29

申请号：US14792238

申请日：2015-07-06

Applicant: Applied Materials Israel Ltd.

Inventor： Michele Dalla-Torre ,  Gil Shabat ,  Adi Dafni ,  Amit Batikoff

IPC: G06T7/00 ,  G01N21/95

CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/9515 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: An analysis system capable of classifying possible defects identified within an inspection image of an inspected object includes a storage device and a processor. The processor matches a template and a portion of the inspection image, thus giving rise to a matching portion of the inspection image. The inspection image is captured by an inspection tool. The processor associates, using a mask corresponding to the template and defining one or more segments within the matching portion of the inspection image, a potential defect with a segment defined by the mask and corresponding to a location of the potential defect, and classifies the potential defect in accordance with the segment defined by the mask within the matching portion of the inspection image and associated with the potential defect.

Abstract translation: 能够分类被检查对象的检查图像内识别出的可能缺陷的分析系统包括存储装置和处理器。 处理器匹配模板和检查图像的一部分，从而产生检查图像的匹配部分。 检查图像由检查工具捕获。 处理器使用与模板相对应的掩模并且在检查图像的匹配部分内定义一个或多个段，具有由掩模限定并对应于潜在缺陷的位置的区段的潜在缺陷，并将潜在的潜在分类 根据由检查图像的匹配部分中的掩模限定的区段并与潜在缺陷相关联的缺陷。