公开(公告)号：US20250153292A1

公开(公告)日：2025-05-15

申请号：US18510505

申请日：2023-11-15

Applicant: Applied Materials Israel Ltd.

Inventor： Hagay Cafri

IPC: B23Q3/08 ,  G01N21/95 ,  G01N35/00

Abstract: A vacuum chuck for supporting a sample, the vacuum chuck comprising: a support plate having an upper planar support surface sized and shaped to retain a sample disposed thereon; one or more vacuum lines formed within the support plate; a plurality of cavities formed within the support plate, wherein each cavity is fluidly coupled to a vacuum line in the one or more vacuum lines and includes an aperture at an upper surface of the planar support surface; and a plurality of vacuum pad plungers corresponding in number to the plurality of cavities, wherein each vacuum pad plunger is disposed in a unique one of the cavities and comprises a plunger body having a vacuum channel extending through its length and a biasing mechanism, wherein the plunger body is moveable between an up position in which a portion of the plunger body extends through the aperture of its respective cavity protruding above the upper planar support surface and a down position in which the plunger body is retracted into the cavity, and wherein the biasing mechanism biases the plunger body in the up position.

公开(公告)号：US20250065509A1

公开(公告)日：2025-02-27

申请号：US18236322

申请日：2023-08-21

Applicant: Applied Materials Israel Ltd.

Inventor： Hagay Cafri ,  Erez Admoni

IPC: B25J11/00 ,  B25J9/16 ,  B25J17/02

Abstract: An apparatus that includes an end effector for handling and transporting wafers, the end effector including: a base portion having a first end adapted to be attached to a robot; a wafer support platform having a surface to support a wafer, a slidable joint coupling the base portion to the wafer support platform; and a sensor configured to detect when the wafer support platform slides relative to the base portion beyond a predetermined distance.