REACTIVE PARTICLES SUPPLY SYSTEM
    2.
    发明申请

    公开(公告)号:US20220199370A1

    公开(公告)日:2022-06-23

    申请号:US17129747

    申请日:2020-12-21

    IPC分类号: H01J37/32

    摘要: A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path. The second reactive particles output is configured to output reactive particles towards an opening of a vacuumed chamber. The adjustable reactive particles output unit is arranged to mechanically configure at least one element of the reactive particles path according to the reactive particles condition.