公开(公告)号：US10971618B2

公开(公告)日：2021-04-06

申请号：US16530331

申请日：2019-08-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Davidescu ,  Yehuda Zur

IPC: H01L21/302 ,  H01L29/78 ,  H01L21/30 ,  H01L21/306

Abstract: A miller, a non-transitory computer-readable medium, and a method for milling a multi-layered object. The method may include milling each structural element of an array of structural elements that are spaced apart from each other by gaps to provide the milled structural elements, wherein each milled structural element has a flat upper surface, wherein prior the milling each one of the structural elements of the array has a flat upper surface of a certain width, wherein the certain width is of a nanometric scale. The milling of each structural element of the array may include scanning a defocused ion beam of the certain width along a longitudinal axis of the structural element. A current intensity of the defocused ion beam decreases with a distance from a middle of the defocused ion beam.

公开(公告)号：US11315754B2

公开(公告)日：2022-04-26

申请号：US16859974

申请日：2020-04-27

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ilya Blayvas ,  Gal Bruner ,  Yehuda Zur ,  Alexander Mairov ,  Ron Davidescu ,  Kfir Dotan ,  Alon Litman

IPC: G01N1/32 ,  H01J37/305

Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.

公开(公告)号：US20210335571A1

公开(公告)日：2021-10-28

申请号：US16859974

申请日：2020-04-27

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ilya Blayvas ,  Gal Bruner ,  Yehuda Zur ,  Alexander Mairov ,  Ron Davidescu ,  Kfir Dotan ,  Alon Litman

IPC: H01J37/305 ,  G01N1/32

Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.

公开(公告)号：US20210036142A1

公开(公告)日：2021-02-04

申请号：US16530331

申请日：2019-08-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron Davidescu ,  Yehuda Zur

IPC: H01L29/78

Abstract: A miller, a non-transitory computer-readable medium, and a method for milling a multi-layered object. The method may include milling each structural element of an array of structural elements that are spaced apart from each other by gaps to provide the milled structural elements, wherein each milled structural element has a flat upper surface, wherein prior the milling each one of the structural elements of the array has a flat upper surface of a certain width, wherein the certain width is of a nanometric scale. The milling of each structural element of the array may include scanning a defocused ion beam of the certain width along a longitudinal axis of the structural element. A current intensity of the defocused ion beam decreases with a distance from a middle of the defocused ion beam.