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公开(公告)号：US11315754B2
公开(公告)日：2022-04-26
申请号：US16859974
申请日：2020-04-27
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Ilya Blayvas , Gal Bruner , Yehuda Zur , Alexander Mairov , Ron Davidescu , Kfir Dotan , Alon Litman
IPC: G01N1/32 , H01J37/305
Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.
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公开(公告)号：US10074513B2
公开(公告)日：2018-09-11
申请号：US15414517
申请日：2017-01-24
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Alon Litman , Efim Vinnitsky , Ofir Arzouan , Igor Petrov
IPC: H01J37/244 , H01J37/28 , H01J37/20
CPC classification number: H01J37/244 , H01J37/145 , H01J37/20 , H01J37/28 , H01J2237/024 , H01J2237/032 , H01J2237/047 , H01J2237/2445 , H01J2237/24475 , H01J2237/2448
Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.
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3.发明申请公开(公告)号：US20150362524A1
公开(公告)日：2015-12-17
申请号：US14719193
申请日：2015-05-21
Applicant: Applied Materials Israel, Ltd.
Inventor： Konstantin Chirko , Alon Litman
IPC: G01Q60/30
CPC classification number: G01Q60/30 , G01Q30/02 , H01J37/28 , H01J2237/281 , H01J2237/2815
Abstract: A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
Abstract translation: 一种用于评估具有纳米尺度宽度并形成在衬底中的高纵横比（HAR）孔的系统，方法和非暂时计算可读介质，包括在照明周期期间通过静电测量装置获得多个测量结果， 包括放置在靠近HAR孔的探针尖端; 其中所述HAR孔内的多个位置在照明周期期间用带电粒子束照射; 并处理多个测量结果以确定HAR孔的状态。
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公开(公告)号：US10211026B2
公开(公告)日：2019-02-19
申请号：US15703925
申请日：2017-09-13
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Alon Litman , Efim Vinnitsky
IPC: H01J37/244 , H01J37/20 , H01J37/285 , H01J37/28
Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.
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公开(公告)号：US20180012728A1
公开(公告)日：2018-01-11
申请号：US15703925
申请日：2017-09-13
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Alon Litman , Efim Vinnitsky
IPC: H01J37/244 , H01J37/28 , H01J37/20 , H01J37/285
CPC classification number: H01J37/244 , H01J37/20 , H01J37/28 , H01J37/285 , H01J2237/024 , H01J2237/2445 , H01J2237/2807
Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.
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Patent Agency Ranking
公开(公告)号：US20160322195A1
公开(公告)日：2016-11-03
申请号：US15207024
申请日：2016-07-11
Applicant: APPLIED MATERIALS ISRAEL, LTD. , Applied Materials, Inc.
Inventor： Benzion Sender , Alon Litman
CPC classification number: H01J37/265 , H01J2237/15 , H01J2237/202 , H01J2237/20228 , H01J2237/28
Abstract: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprises: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.
Abstract translation: 一种用于使用一个或多个带电粒子束扫描衬底的多个感兴趣区域的系统，所述系统包括：具有带电粒子光学器件的照射模块; 用于在衬底和带电粒子光学器件之间引入相对运动的阶段; 成像模块，用于响应于所述一个或多个带电粒子束对感兴趣区域的扫描，收集从衬底发射的电子; 并且其中带电粒子光学器件被布置成在感兴趣区域的扫描期间执行带电粒子束的反向运动，从而抵抗在感兴趣区域的扫描期间在衬底和带电粒子光学器件之间引入的相对运动。
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公开(公告)号：US09470751B2
公开(公告)日：2016-10-18
申请号：US14153982
申请日：2014-01-13
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Amir Shoham , Alon Litman
IPC: G01R31/305 , G01R31/26 , G01R31/28
CPC classification number: G01R31/305 , G01R31/2812 , G01R31/2853
Abstract: A system and a method for evaluating a conductor, the method may include: illuminating a first area of a conductor by a first electron beam thereby charging the first area; illuminating by a second electron beam a second area of the conductor; and wherein an aggregate size of the first and second areas is a fraction of an overall size of the conductor; detecting, by a detector, detected emitted electrons that were emitted substantially from the second area and generating detection signals indicative of the detected emitted electrons; and processing, by a processor, the detection signals to provide information about a conductivity of the conductor.
Abstract translation: 一种用于评估导体的系统和方法，所述方法可以包括：通过第一电子束照射导体的第一区域，从而对第一区域充电; 通过第二电子束照射导体的第二区域; 并且其中所述第一和第二区域的聚集体尺寸是所述导体的总体尺寸的一部分; 通过检测器检测基本上从第二区域发射的检测到的发射电子并产生指示检测到的发射电子的检测信号; 以及由处理器处理检测信号以提供关于导体的导电性的信息。
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公开(公告)号：US09466462B2
公开(公告)日：2016-10-11
申请号：US14153923
申请日：2014-01-13
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Benzion Sender , Alon Litman
IPC: H01J37/26
CPC classification number: H01J37/265 , H01J2237/15 , H01J2237/202 , H01J2237/20228 , H01J2237/28
Abstract: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system may include: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.
Abstract translation: 一种用于使用一个或多个带电粒子束扫描衬底的多个感兴趣区域的系统，所述系统可以包括：具有带电粒子光学器件的照射模块; 用于在衬底和带电粒子光学器件之间引入相对运动的阶段; 成像模块，用于响应于所述一个或多个带电粒子束对感兴趣区域的扫描，收集从衬底发射的电子; 并且其中带电粒子光学器件被布置成在感兴趣区域的扫描期间执行带电粒子束的反向运动，从而抵抗在感兴趣区域的扫描期间在衬底和带电粒子光学器件之间引入的相对运动。
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公开(公告)号：US09366954B2
公开(公告)日：2016-06-14
申请号：US13948975
申请日：2013-07-23
Applicant: Applied Materials Israel, Ltd.
Inventor： Alon Litman , Nir Ben-David Dodzin , Albert Karabekov , Alex Goldenshtein
CPC classification number: G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.
Abstract translation: 一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子显示出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器。
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公开(公告)号：US09297692B2
公开(公告)日：2016-03-29
申请号：US13772287
申请日：2013-02-20
Applicant: APPLIED MATERIALS ISRAEL, LTD.
Inventor： Yoram Uziel , Alon Litman , Ofer Adan , Ron Naftali , Juergen Frosien
CPC classification number: G01J1/0266 , G01J1/0422 , G01N21/8806 , G01N21/9501 , G01N21/956 , G02B13/001 , G02B21/0016 , G02B21/24
Abstract: An evaluation system that includes a miniature module that comprises a miniature objective lens and a miniature supporting module; wherein the miniature supporting module is arranged, when placed on a sample, to position the miniature objective lens at working distance from the sample; wherein the miniature objective lens is arranged to gather radiation from an area of the sample when positioned at the working distance from the sample; a sensor arranged to detect radiation that is gathered by the miniature objective lens to provide detection signals indicative of the area of the sample.
Abstract translation: 一种包括微型模块的评估系统，包括微型物镜和微型支撑模块; 其中所述微型支撑模块布置在放置在样本上以使所述微型物镜定位在距离所述样品的工作距离处; 其中所述微型物镜被布置成在距所述样品的工作距离处定位时收集来自所述样品的区域的辐射; 传感器，被布置成检测由微型物镜聚集的辐射，以提供指示样品面积的检测信号。
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