公开(公告)号：US20240280802A1

公开(公告)日：2024-08-22

申请号：US18405683

申请日：2024-01-05

Applicant: Applied Materials Israel Ltd.

Inventor： Boris GOLBERG ,  Haim FELDMAN ,  Ron NAFTALI

IPC: G02B26/04

CPC classification number: G02B26/04

Abstract: An illumination module of a wafer inspection system including: an illumination source providing ultraviolet illumination with wavelengths below 300 nm; a pulse cascader, optically coupled to the illumination source to receive the ultraviolet illumination, which pulse cascade including a chain of a plurality of loops, each loop including: a loop input and a loop output, a first loop output optically coupled to a loop input of a subsequent loop in the chain; and a delay line having: a delay line input optically coupled to the loop input; and a delay line output, the delay line configured to output a delay line light output, from the delay line output, including an image of light received at the delay line input, after a time delay from a time of receipt of light received at the delay line input; and a splitter configured to receive light at a splitter input and output a first portion of the light from the loop through a loop output and to pass a second portion of the light to the delay line input.

公开(公告)号：US20240280506A1

公开(公告)日：2024-08-22

申请号：US18409698

申请日：2024-01-10

Applicant: Applied Materials Israel Ltd.

Inventor： Elad EIZNER ,  Haim FELDMAN ,  Boris GOLBERG ,  Ron NAFTALI ,  Keith WELLS

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N2201/06113 ,  G01N2201/103

Abstract: Implementations disclosed describe, among other things, a sample inspection system that includes an illumination subsystem to illuminate a sample with a plurality of time-spaced light pulses generated, using a pulse multiplexing system, from a source light pulse. The pulse multiplexing system includes a plurality of optical loops, each deploying an optical coupler that outputs a first portion of incident light to a sample and provides a second portion of incident light as an input into the next optical loop. The sample inspection system further includes a collection subsystem to collect a portion of light generated upon interaction of the plurality of time-spaced light pulses with the sample, and a light detection subsystem to detect the collected portion of light.

公开(公告)号：US20190259564A1

公开(公告)日：2019-08-22

申请号：US15900428

申请日：2018-02-20

Applicant: Technische Universiteit Delft ,  Applied Materials Israel, Ltd.

Inventor： Pieter KRUIT ,  Ron NAFTALI

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22

Abstract: A multi-beam charged particle column for inspecting a surface of a sample includes a source for creating multiple primary charged particle beams which are directed towards the sample, an objective lens unit for focusing the primary charged particle beams on the sample, a detector for detecting signal charged particles from the sample, and a magnetic deflection unit arranged between the detector and the sample. The magnetic deflection unit includes a plurality of strips of a magnetic or ferromagnetic material. At least two strips of the plurality of strips are located at opposite sides of a trajectory of a primary charged particle beam and within a distance equal to a pitch of the trajectories of the primary charged particle beams at the magnetic deflection unit. The strips are configured to establish a magnetic field having field lines substantially perpendicular to the trajectories of the primary charged particle beams.

公开(公告)号：US20250055241A1

公开(公告)日：2025-02-13

申请号：US18231221

申请日：2023-08-07

Applicant: Applied Materials Israel Ltd.

Inventor： Ron NAFTALI ,  Haim FELDMAN ,  Boris GOLBERG ,  Ram ORON

IPC: H01S3/00

Abstract: A pulse stretcher unit, and a respecting inspection system are disclosed. The pulse stretcher unit comprises a selected number of beam splitters arranged along a selected main path and comprising an input beam splitter, an output beam splitter and one or more intermediate beam splitters, and an arrangement of light reflecting surfaces defining a selected number of n auxiliary paths extending between said selected number of beam splitters. Wherein said selected number of beam splitters direct input beam between said selected main path and said selected number of auxiliary paths for splitting an input pulse into a series of pulses having generally equal amplitude. And wherein lengths of said auxiliary paths follow approximately a series of the form L/2k for k=0, 1, 2, where L is a selected length of an auxiliary path.

公开(公告)号：US20240255770A1

公开(公告)日：2024-08-01

申请号：US18104230

申请日：2023-01-31

Applicant: Applied Materials Israel Ltd.

Inventor： Boris GOLBERG ,  Haim FELDMAN ,  Avishai BARTOV ,  Ron NAFTALI

IPC: G02B27/28 ,  G01N21/88 ,  G01N21/95 ,  G02F1/13363

CPC classification number: G02B27/283 ,  G01N21/8806 ,  G01N21/95 ,  G02F1/13363 ,  G02B2207/117

Abstract: A polarizer system is described. The polarizer system comprises at least one polarization beam splitter, a polarization rotator, and a beam combiner. The at least one polarization beam splitter is positioned to receive input radiation beam and to split the input radiation beam directing a first beam portion having a first linear polarization orientation along a first path and a second beam portion having a second linear polarization orientation orthogonal to said first linear polarization orientation along a second path. The polarization rotator is located along said second path and configured to rotate polarization of said beam portion to be parallel to said first linear polarization orientation. The beam combiner is configured and positioned to combine said first and second beam portions to form a common beam having said first linear polarization orientation propagating along a selected optical path.

公开(公告)号：US20190259570A1

公开(公告)日：2019-08-22

申请号：US15900415

申请日：2018-02-20

Applicant: Technische Universiteit Delft ,  Applied Materials Israel, Ltd.

Inventor： Pieter KRUIT ,  Ron NAFTALI

IPC: H01J37/22 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/1475 ,  H01J37/244 ,  H01J2237/1508 ,  H01J2237/2445 ,  H01J2237/2448 ,  H01J2237/24592

Abstract: Apparatus and method for inspecting a surface of a sample. The apparatus includes a multi-beam charged particle column comprising a source for creating multiple primary beams directed towards the sample, an objective lens for focusing the primary beams on the sample, an electron-photon converter unit having an array of electron to photon converter sections, each section is located next to a primary beam within a distance equal to a pitch of the primary beams at the electro-photon converter unit, a photon transport unit for transporting light from the electron to photon converter sections to a photo detector, and an electron collection unit for guiding secondary electrons created in the sample, towards the electron-photon converter unit. The electron collection unit is arranged to project secondary electrons created in the sample by one of said primary beams to at least one of the electron to photon converter sections.