公开(公告)号：US20240153043A1

公开(公告)日：2024-05-09

申请号：US17983181

申请日：2022-11-08

Applicant: Applied Materials Israel Ltd.

Inventor： Tamir EINY ,  Dror ALUMOT ,  Yarden ZOHAR ,  Anna LEVANT

IPC: G06T5/00 ,  G06T5/50 ,  G06T7/30

CPC classification number: G06T5/002 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10016 ,  G06T2207/20081 ,  G06T2207/20212 ,  G06T2207/30148

Abstract: There is provided an image generation system and method. The method comprises obtaining a runtime image of a semiconductor specimen with a low Signal-to-noise ratio (SNR), and processing the runtime image using a machine learning (ML) model to obtain an output image with a high SNR. The ML model is previously trained using a training set comprising a plurality of low SNR images associated with a high SNR image. The plurality of low SNR images correspond to a plurality of sequences of frames acquired in a plurality of runs of scanning a first site of the specimen. The high SNR image is generated based on the plurality of low SNR images. The training comprises, for each low SNR image: processing the low SNR image by the ML model to obtain predicted image data, and optimizing the ML model based on the predicted image data and the high SNR image.