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公开(公告)号:US20240153043A1
公开(公告)日:2024-05-09
申请号:US17983181
申请日:2022-11-08
Applicant: Applied Materials Israel Ltd.
Inventor: Tamir EINY , Dror ALUMOT , Yarden ZOHAR , Anna LEVANT
CPC classification number: G06T5/002 , G06T5/50 , G06T7/30 , G06T2207/10016 , G06T2207/20081 , G06T2207/20212 , G06T2207/30148
Abstract: There is provided an image generation system and method. The method comprises obtaining a runtime image of a semiconductor specimen with a low Signal-to-noise ratio (SNR), and processing the runtime image using a machine learning (ML) model to obtain an output image with a high SNR. The ML model is previously trained using a training set comprising a plurality of low SNR images associated with a high SNR image. The plurality of low SNR images correspond to a plurality of sequences of frames acquired in a plurality of runs of scanning a first site of the specimen. The high SNR image is generated based on the plurality of low SNR images. The training comprises, for each low SNR image: processing the low SNR image by the ML model to obtain predicted image data, and optimizing the ML model based on the predicted image data and the high SNR image.
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公开(公告)号:US20220082376A1
公开(公告)日:2022-03-17
申请号:US17024578
申请日:2020-09-17
Applicant: Applied Materials Israel Ltd.
Inventor: Rafael BISTRITZER , Anna LEVANT , Moshe ELIASOF , Michael CHEMAMA , Konstantin CHIRKO
IPC: G01B15/02 , G01N23/2251 , H01J37/147
Abstract: There is provided a system and a method comprising obtaining a first (respectively second) image of an area of the semiconductor specimen acquired by an electron beam examination tool at a first (respectively second) illumination angle, determining a plurality of height values informative of a height profile of the specimen in the area, the determination comprising solving an optimization problem which comprises a plurality of functions, each function being representative of a difference between data informative of a grey level intensity at a first location in the first image and data informative of a grey level intensity at a second location in the second image, wherein, for each function, the second location is determined with respect to the first location, or conversely, when solving the optimization problem, wherein a distance between the first and the second locations depends on the height profile, and the first and second illumination angles.
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