公开(公告)号：US20060215161A1

公开(公告)日：2006-09-28

申请号：US11232236

申请日：2005-09-22

申请人： Arie Den Boef ,  Andre Jeunink ,  Henricus Pellemans ,  Irwan Setija ,  Cas Johannes Van Nuenen ,  Stefan Carolus Keij

发明人： Arie Den Boef ,  Andre Jeunink ,  Henricus Pellemans ,  Irwan Setija ,  Cas Johannes Van Nuenen ,  Stefan Carolus Keij

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G03F9/7092

摘要： A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.

摘要翻译： 根据一个实施例的光刻设备包括用于对准衬底的对准系统。 对准系统包括照明器系统，其被配置为用照明点照射基板上的对准标记，该对准标记包括多个线和间隔。 该系统还包括一个组合器系统，被配置为传送照明对准标记的两个图像，而不对图像进行空间滤波，使图像相对于彼此旋转180度，并组合两个图像; 以及检测系统，被配置为检测来自组合图像的对准信号，并且通过选择检测到的对准信号中的特定值之一来确定唯一的对准位置。

公开(公告)号：US20070229785A1

公开(公告)日：2007-10-04

申请号：US11390416

申请日：2006-03-28

申请人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

发明人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

IPC分类号： G03B27/68

CPC分类号： G03B27/42 ,  G03F7/70633

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

摘要翻译： 布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅 ，垂直，方向。 光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。 两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。 提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。