公开(公告)号：US07714033B2

公开(公告)日：2010-05-11

申请号：US11831258

申请日：2007-07-31

申请人： Atsushi Ito ,  Hirofumi Goto ,  Hirofumi Sasaki ,  Ryuichi Okuda

发明人： Atsushi Ito ,  Hirofumi Goto ,  Hirofumi Sasaki ,  Ryuichi Okuda

IPC分类号： G03F7/004 ,  C08G59/68 ,  C08G65/10

CPC分类号： G03F7/0382 ,  G03F7/0045

摘要： The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.]

摘要翻译： 本发明的目的是提供对g线和h线高度敏感的感光性绝缘树脂组合物，能够形成各种性能优异的表面保护膜，层间绝缘膜和平坦化膜 包括分辨率，电绝缘性和耐热冲击性，固化产物和具有固化产物的电子部件。 本发明的感光性绝缘性树脂组合物含有具有酚性羟基的碱溶性树脂，含有下述通式（1）表示的s-三嗪衍生物的辐射敏感性酸发生剂和交联剂。 [式（1）中，R为氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，X为卤素原子，Y为氧原子或硫原子。

公开(公告)号：US20080045621A1

公开(公告)日：2008-02-21

申请号：US11831258

申请日：2007-07-31

申请人： Atsushi Ito ,  Hirofumi Goto ,  Hirofumi Sasaki ,  Ryuichi Okuda

发明人： Atsushi Ito ,  Hirofumi Goto ,  Hirofumi Sasaki ,  Ryuichi Okuda

IPC分类号： G03C1/73

CPC分类号： G03F7/0382 ,  G03F7/0045

摘要： The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkali-soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent. [In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.]

摘要翻译： 本发明的目的是提供对g线和h线高度敏感的感光性绝缘树脂组合物，能够形成各种性能优异的表面保护膜，层间绝缘膜和平坦化膜 包括分辨率，电绝缘性和耐热冲击性，固化产物和具有固化产物的电子部件。 本发明的感光性绝缘性树脂组合物含有具有酚性羟基的碱溶性树脂，含有下述通式（1）表示的s-三嗪衍生物的辐射敏感性酸发生剂和交联剂。 [式（1）中，R为氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，X为卤素原子，Y为氧原子或硫原子。

公开(公告)号：US20100167204A1

公开(公告)日：2010-07-01

申请号：US12377721

申请日：2007-07-19

申请人： Ryuichi Okuda ,  Hirofumi Goto

发明人： Ryuichi Okuda ,  Hirofumi Goto

IPC分类号： G03F7/004

CPC分类号： G03F7/038 ,  C08K3/013 ,  C08K5/34922 ,  C08L13/00 ,  C08L61/04 ,  C08L61/06 ,  C08L2205/02 ,  G03F7/0045 ,  G03F7/0047 ,  H05K3/287 ,  H05K3/4676 ,  C08L21/00 ,  C08L2666/08 ,  C08L2666/16

摘要： A radiation-sensitive insulation resin composition contains (A) an alkali-soluble resin, (B) a crosslinking agent, (C) a radiation-sensitive acid generator, (D) an inorganic filler, and (E) crosslinked rubber particles. The composition can be developed using an alkali developer, does not incur damages in insulating properties and resolution properties, suppresses thermal deformation, and can produce a layer exhibiting excellent adhesion to conductor wiring layers.

摘要翻译： 辐射敏感性绝缘树脂组合物包含（A）碱溶性树脂，（B）交联剂，（C）辐射敏感酸产生剂，（D）无机填料和（E）交联橡胶颗粒。 该组合物可以使用碱性显影剂显影，不会对绝缘性和分辨性造成损害，抑制热变形，并且可以产生对导体布线层具有优异粘附性的层。