PIXEL STRUCTURE
    1.
    发明申请
    PIXEL STRUCTURE 审中-公开
    像素结构

    公开(公告)号:US20150021708A1

    公开(公告)日:2015-01-22

    申请号:US14509061

    申请日:2014-10-08

    CPC classification number: H01L27/124 G02F1/136286 G02F2001/13629

    Abstract: A pixel structure includes a substrate, a scan line on the substrate, a data line set, an active device, and a pixel electrode. The substrate has a display region and a peripheral region around the display region. The display region includes at least one sub-pixel region. The data line set is disposed on the substrate, located at one side of the sub-pixel region, and intersected with the scan line to form at least one first intersecting region. The data line set includes a first and a second data lines that are intersected to form at least one second intersecting region. The first and the second data lines are electrically insulated. The active device electrically connects the scan line and to the first data line or the second data line in the data line set. The pixel electrode is located in the sub-pixel region and electrically connects the active device.

    Abstract translation: 像素结构包括衬底,衬底上的扫描线,数据线组,有源器件和像素电极。 衬底具有显示区域和围绕显示区域的周边区域。 显示区域包括至少一个子像素区域。 数据线组设置在基板上,位于子像素区域的一侧,并与扫描线相交以形成至少一个第一相交区域。 数据线组包括相交的第一和第二数据线以形成至少一个第二相交区域。 第一和第二数据线是电绝缘的。 有源器件将扫描线与数据线组中的第一数据线或第二数据线电连接。 像素电极位于子像素区域中并且电连接有源器件。

    PIXEL STRUCTURE
    2.
    发明申请
    PIXEL STRUCTURE 审中-公开
    像素结构

    公开(公告)号:US20140313467A1

    公开(公告)日:2014-10-23

    申请号:US14320660

    申请日:2014-07-01

    CPC classification number: G02F1/136213

    Abstract: A pixel structure including a scan line, a data line, an active device, a pixel electrode, a capacitor electrode line, a semi-conductive pattern layer and at least one dielectric layer is provided. The active device is electrically connected to the scan line and the data line. The pixel electrode is electrically connected to the active device. The capacitor electrode line is located under the pixel electrode. A first storage capacitor is formed between the capacitor electrode line and the pixel electrode. The semi-conductive pattern layer is disposed between the capacitor electrode line and the pixel electrode, the pixel electrode is electrically connected to the semi-conductive pattern layer. A second storage capacitor is formed between the semi-conductive pattern layer and the capacitor electrode line. The dielectric layer is disposed between the capacitor electrode line and the pixel electrode and located between the semi-conductive pattern layer and the capacitor electrode line.

    Abstract translation: 提供了包括扫描线,数据线,有源器件,像素电极,电容器电极线,半导体图案层和至少一个电介质层的像素结构。 有源器件电连接到扫描线和数据线。 像素电极电连接到有源器件。 电容器电极线位于像素电极下方。 在电容器电极线和像素电极之间形成第一存储电容器。 半导体图案层设置在电容器电极线和像素电极之间,像素电极电连接到半导体图案层。 在半导体图案层和电容器电极线之间形成第二存储电容器。 电介质层配置在电容电极线与像素电极之间,位于半导电图案层与电容电极线之间。

    Pixel structure having metal-insulator-semiconductor capacitor
    3.
    发明授权
    Pixel structure having metal-insulator-semiconductor capacitor 有权
    具有金属 - 绝缘体 - 半导体电容器的像素结构

    公开(公告)号:US09046726B2

    公开(公告)日:2015-06-02

    申请号:US14320660

    申请日:2014-07-01

    CPC classification number: G02F1/136213

    Abstract: A pixel structure including a scan line, a data line, an active device, a pixel electrode, a capacitor electrode line, a semi-conductive pattern layer and at least one dielectric layer is provided. The active device is electrically connected to the scan line and the data line. The pixel electrode is electrically connected to the active device. The capacitor electrode line is located under the pixel electrode. A first storage capacitor is formed between the capacitor electrode line and the pixel electrode. The semi-conductive pattern layer is disposed between the capacitor electrode line and the pixel electrode, the pixel electrode is electrically connected to the semi-conductive pattern layer. A second storage capacitor is formed between the semi-conductive pattern layer and the capacitor electrode line. The dielectric layer is disposed between the capacitor electrode line and the pixel electrode and located between the semi-conductive pattern layer and the capacitor electrode line.

    Abstract translation: 提供了包括扫描线,数据线,有源器件,像素电极,电容器电极线,半导体图案层和至少一个电介质层的像素结构。 有源器件电连接到扫描线和数据线。 像素电极电连接到有源器件。 电容器电极线位于像素电极下方。 在电容器电极线和像素电极之间形成第一存储电容器。 半导体图案层设置在电容器电极线和像素电极之间,像素电极电连接到半导体图案层。 在半导体图案层和电容器电极线之间形成第二存储电容器。 电介质层配置在电容电极线与像素电极之间,位于半导电图案层与电容电极线之间。

    Pixel structure having metal-insulator-semiconductor capacitor

    公开(公告)号:US09025098B2

    公开(公告)日:2015-05-05

    申请号:US14320657

    申请日:2014-07-01

    CPC classification number: G02F1/136213

    Abstract: A pixel structure including a scan line, a data line, an active device, a pixel electrode, a capacitor electrode line, a semi-conductive pattern layer and at least one dielectric layer is provided. The active device is electrically connected to the scan line and the data line. The pixel electrode is electrically connected to the active device. The capacitor electrode line is located under the pixel electrode. A first storage capacitor is formed between the capacitor electrode line and the pixel electrode. The semi-conductive pattern layer is disposed between the capacitor electrode line and the pixel electrode, the pixel electrode is electrically connected to the semi-conductive pattern layer. A second storage capacitor is formed between the semi-conductive pattern layer and the capacitor electrode line. The dielectric layer is disposed between the capacitor electrode line and the pixel electrode and located between the semi-conductive pattern layer and the capacitor electrode line.

    PIXEL STRUCTURE
    5.
    发明申请
    PIXEL STRUCTURE 审中-公开

    公开(公告)号:US20140313466A1

    公开(公告)日:2014-10-23

    申请号:US14320657

    申请日:2014-07-01

    CPC classification number: G02F1/136213

    Abstract: A pixel structure including a scan line, a data line, an active device, a pixel electrode, a capacitor electrode line, a semi-conductive pattern layer and at least one dielectric layer is provided. The active device is electrically connected to the scan line and the data line. The pixel electrode is electrically connected to the active device. The capacitor electrode line is located under the pixel electrode. A first storage capacitor is formed between the capacitor electrode line and the pixel electrode. The semi-conductive pattern layer is disposed between the capacitor electrode line and the pixel electrode, the pixel electrode is electrically connected to the semi-conductive pattern layer. A second storage capacitor is formed between the semi-conductive pattern layer and the capacitor electrode line. The dielectric layer is disposed between the capacitor electrode line and the pixel electrode and located between the semi-conductive pattern layer and the capacitor electrode line.

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