公开(公告)号：US20220353201A1

公开(公告)日：2022-11-03

申请号：US17735434

申请日：2022-05-03

申请人： Avesha, Inc.

发明人： Prabhudev Navali ,  Raj Nair ,  Prasad Dorbala ,  Sudhir Halbhavi ,  Sai Koti Reddy

IPC分类号： H04L47/80 ,  H04L47/762 ,  H04L47/78 ,  H04L47/125

摘要： A technique is directed toward controlling placement of workloads of an application within an application environment. The technique involves, while a first placement of workloads of the application is in a first deployment of resources within the application environment, generating a set of resource deployment changes that accommodates a predicted change in demand on the application. The technique further involves adjusting the first deployment of resources within the application environment to form a second deployment of resources within the application environment, the second deployment of resources being different from the first deployment of resources. The technique further involves providing a second placement of workloads of the application in the second deployment of resources to accommodate the predicted change in demand on the application, the second placement of workloads being different from the first placement of workloads.