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1.
公开(公告)号:US11340179B2
公开(公告)日:2022-05-24
申请号:US17076303
申请日:2020-10-21
Inventor: Eugene M. Lavely , Amrita V. Masurkar , Thomas J. Stark
IPC: G01N23/00 , G01N23/2251
Abstract: Techniques are provided for tomographic imaging with sub-beam resolution and spectral enhancement. A system implementing the techniques according to an embodiment includes a target structure comprising one or more selected materials nanopatterned on a first surface of the target structure in a selected arrangement. The system also includes a primary particle beam source to provide a particle beam incident on an area of the first surface of the target structure, the area encompassing one or more of the nanopatterned materials, such that the materials generate characteristic X-rays in response to the primary beam. The system further includes a spectral energy detector (SED) to perform individual photon counting and spectral analysis of the characteristic X-rays and estimate attenuation properties of the imaged sample. The sample is positioned both adjacent to a second surface of the target structure, opposite the first surface, and between the target structure and the SED.
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公开(公告)号:US20190311881A1
公开(公告)日:2019-10-10
申请号:US15949166
申请日:2018-04-10
Inventor: Eugene M. Lavely , Adam J. Marcinuk , Amrita V. Masurkar , Paul R. Moffitt , Michael S. Richman , Jonathan R. Takahashi , Jonathan K. Tong , Chris L. Willis
IPC: H01J37/244 , H01J37/20 , H01J37/28 , H01J37/22
Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.
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3.
公开(公告)号:US20210116400A1
公开(公告)日:2021-04-22
申请号:US17076303
申请日:2020-10-21
Inventor: Eugene M. Lavely , Amrita V. Masurkar , Thomas J. Stark
IPC: G01N23/2251
Abstract: Techniques are provided for tomographic imaging with sub-beam resolution and spectral enhancement. A system implementing the techniques according to an embodiment includes a target structure comprising one or more selected materials nanopatterned on a first surface of the target structure in a selected arrangement. The system also includes a primary particle beam source to provide a particle beam incident on an area of the first surface of the target structure, the area encompassing one or more of the nanopatterned materials, such that the materials generate characteristic X-rays in response to the primary beam. The system further includes a spectral energy detector (SED) to perform individual photon counting and spectral analysis of the characteristic X-rays and estimate attenuation properties of the imaged sample. The sample is positioned both adjacent to a second surface of the target structure, opposite the first surface, and between the target structure and the SED.
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公开(公告)号:US10468230B2
公开(公告)日:2019-11-05
申请号:US15949166
申请日:2018-04-10
Inventor: Eugene M. Lavely , Adam J. Marcinuk , Amrita V. Masurkar , Paul R. Moffitt , Michael S. Richman , Jonathan R. Takahashi , Jonathan K. Tong , Chris L. Willis
Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.
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